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  • 2011 [15]
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Absorption enhancement analysis of crystalline Si thin film solar cells based on broadband antireflection nanocone grating 期刊论文  OAI收割
JOURNAL OF APPLIED PHYSICS, 2011, 卷号: 110, 期号: 11
作者:  
Zhang, RY (张瑞英);  Dong, JR (董建荣);  Zhang, RY (张瑞英);  Yang, H (杨辉)
收藏  |  浏览/下载:10/0  |  提交时间:2012/07/25
Investigation of the partially coherent effects in a 2d talbot interferometer 期刊论文  iSwitch采集
Analytical and bioanalytical chemistry, 2011, 卷号: 401, 期号: 3, 页码: 865-870
作者:  
Ge, Xin;  Wang, Zhili;  Gao, Kun;  Zhang, Kai;  Hong, Youli
收藏  |  浏览/下载:19/0  |  提交时间:2019/04/23
Optical semiconductor device 专利  OAI收割
专利号: US7983318, 申请日期: 2011-07-19, 公开日期: 2011-07-19
作者:  
HAYAKAWA, AKINORI
  |  收藏  |  浏览/下载:13/0  |  提交时间:2020/01/13
Theoretical investigation on the absorption enhancement of the crystalline silicon solar cells by pyramid texture coated with sinx:h layer 期刊论文  iSwitch采集
Solar energy, 2011, 卷号: 85, 期号: 3, 页码: 530-537
作者:  
Zhao, L.;  Zuo, Y. H.;  Zhou, C. L.;  Li, H. L.;  Diao, H. W.
收藏  |  浏览/下载:21/0  |  提交时间:2019/05/12
Emerging Maskless Nanolithography Based on Novel Diffraction Gratings 专著  OAI收割
:INTECH, 2011
作者:  
Guanxiao Cheng;  Yong Yang;  Chao Hu;  Ping Xu;  Helun Song
收藏  |  浏览/下载:8/0  |  提交时间:2015/08/25
Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文  OAI收割
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China
Tan X.
收藏  |  浏览/下载:20/0  |  提交时间:2013/03/25
In ultraviolet spectroscopy  groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore  there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order  it is important to control the groove shape precisely  so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm  especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method  the required blaze angle is small  we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles  and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model  the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides  since the etched groove shape depends on the aspect ratio of the photoresist mask ridge  if we wish to fabricate larger gratings with this method  we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).  
The research of rigid lapping technique on diamond grating ruling tool (EI CONFERENCE) 会议论文  OAI收割
2010 International Conference on Materials Science and Engineering Science, ICMSES 2010, December 11, 2010 - December 12, 2010, Shenzhen, China
Jirigalantu A.; Bayanheshig; Dong Q. X.
收藏  |  浏览/下载:18/0  |  提交时间:2013/03/25
One of the effective method of improving diamond tool life on rulling large diffraction gratings is developing precise double-cone edged on line edge transfering tool. But traditional died weight or manual lapping technique couldn't meet the precision requirement of on line edge transfering tool. So preliminary studied rigid lapping of diamond grating ruling tool. Choosing traditional BC6063 shaping machine and made a series of alteration on it  achieved the automation of lapping process of diamond grating ruling tool. Through lapping grating ruling tool and AFM measurement find that the surface roughness of tool is 1.51nm  the radius of tool edge is 160nm  edge quality is good enough  this verified the feasibility of rigid lapping of diamond grating ruling tool and lay the foundation for developing precision lapping machine. (2011) Trans Tech Publications  Switzerland.  
The design of chisel-edge ruling tool for diffraction gratings (EI CONFERENCE) 会议论文  OAI收割
2011 International Conference on Mechatronic Science, Electric Engineering and Computer, MEC 2011, August 19, 2011 - August 22, 2011, Jilin, China
作者:  
Zhang F.;  Zhang F.
收藏  |  浏览/下载:21/0  |  提交时间:2013/03/25
The process of parameters design on chisel-edge ruling tool of diffraction grating  which is inefficient and highly costive  needs plenty ruling experience came from a series of ruling test to optimize and design it. In order to reduce the choosing range of experiential design parameters on chisel-edge grating ruling tool  to improve efficiency  and to reduce costs  this paper summarize the experimental results of several gratings ruling process for the experiential design on parameters of chisel-edge ruling tool. Provide the specific parameters choosing range as follows: that the blaze angle and directional angle difference in less than 3  the bottom angle and apex angle difference in less than 5. Apex angle larger than the groove bottom angle in conventional grating  while apex angle smaller than the bottom angle in echelle grating  and the directional angle smaller than blaze angle in both condition. 2011 IEEE.  
拍瓦级激光系统聚焦性能提升及相关技术研究 学位论文  OAI收割
博士: 中国科学院上海光学精密机械研究所, 2011
作者:  
收藏  |  浏览/下载:5/0  |  提交时间:2016/11/28
纳秒脉冲激光对多层介质膜光栅的损伤机理及激光预处理研究 学位论文  OAI收割
硕士: 中国科学院上海光学精密机械研究所, 2011
作者:  
高鹏鹏
收藏  |  浏览/下载:39/0  |  提交时间:2016/11/28