机构

• 半导体研究所 [4]

采集方式

• OAI收割 [4]

内容类型

• 会议论文 [2]
• 期刊论文 [2]

发表日期

• 2012 [1]
• 2006 [1]
• 2005 [1]
• 2004 [1]

学科主题

• 半导体材料 [4]

筛选

浏览/检索结果: 共4条，第1-4条 帮助 限定条件 学科主题：半导体材料     条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择提交时间升序提交时间降序题名升序题名降序作者升序作者降序发表日期升序发表日期降序 Residual strains and optical properties of ZnO thin epilayers grown on r-sapphire planes 期刊论文  OAI收割 semiconductor science and technology, 2012, 卷号: 27, 期号: 3, 页码: 35008 Zheng, CC; Xu, SJ; Ning, JQ; Bao, W; Wang, JF; Gao, J; Liu, JM; Zhu, JH; Liu, XL 收藏  |  浏览/下载：12/0  |  提交时间：2013/03/17 Homoepitaxial growth and characterization of 4H-SiC epilayers by low-pressure hot-wall chemical vapor deposition 会议论文  OAI收割 international conference on silicon carbide and related materials (icscrm 2005), pittsburgh, pa, sep 18-23, 2005 Sun, GS (Sun, Guosheng); Ning, J (Ning, Jin); Gong, QC (Gong, Quancheng); Gao, X (Gao, Xin); Wang, L (Wang, Lei); Liu, XF (Liu, Xingfang); Zeng, YP (Zeng, Yiping); Li, JM (Li, Jinmin) 收藏  |  浏览/下载：100/29  |  提交时间：2010/03/29 homoepitaxial growth  low-pressure hot-wall CVD  structural and optical characteristics  intentional doping  Schottky barrier diodes   Homoepitaxial Growth of 4H-SiC and Ti/4H-SiC SBDs 期刊论文  OAI收割 人工晶体学报, 2005, 卷号: 34, 期号: 6, 页码: 1006-1010 作者:  NING Jin;  LIU Xingfang 收藏  |  浏览/下载：10/0  |  提交时间：2010/11/23 Homoepitaxial growth and MOS structures of 4H-SiC on off oriented n-type (0001)Si-faces 会议论文  OAI收割 7th international conference on solid-state and integrated circuits technology, beijing, peoples r china, oct 18-21, 2004 Sun, GS; Ning, J; Zhang, YX; Gao, X; Wang, L; Zhao, WS; Zeng, YP; Li, JM 收藏  |  浏览/下载：206/60  |  提交时间：2010/03/29 4H-SiC  LPCVD homoepitaxial growth  thermal oxidization  MOS structures  HOT-WALL CVD