中国科学院机构知识库网格系统: 检索

The influence of nanocomposite pour point depressant on the crystallization of waxy oil 期刊论文 OAI收割
FUEL, 2018, 卷号: 221, 页码: 257-268
作者: Huang, Huirong; Wang, Wei; Peng, Zeheng; Ding, Yanfen; Li, Kai

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收藏 | 浏览/下载：49/0 | 提交时间：2019/04/09

Pour Point Depressant Nanocomposite Wax Crystal Diffraction Intensity Interplanar Spacing

Gold nanoshell arrays-based visualized sensors of pH: Facile fabrication and high diffraction intensity 期刊论文 OAI收割
JOURNAL OF MATERIALS RESEARCH, 2017, 卷号: 32, 期号: 4, 页码: 717-725
作者: Men, D. D.; Zhou, F.; Li, H. L.; Hang, L. F.; Li, X. Y.

收藏 | 浏览/下载：29/0 | 提交时间：2018/07/04

2d Colloidal Crystal Au Nanoshell Hydrogel Diffraction Intensity Visualized Sensor

Liquid Crystal Phase Control Method Based on Blazed Grating Model 会议论文 OAI收割
作者: Hongyang Guo[1,2,3], Shengping Du[1.2]

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收藏 | 浏览/下载：18/0 | 提交时间：2018/12/20

Blazed grating Liquid crystal Phase modulation Diffraction intensity

A study of one-dimensional incommensurate modulated structure determination in high-resolution transmission electron microscopy 期刊论文 OAI收割
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 2014, 卷号: 70, 页码: 563
Li, XM; Ge, BH; Li, FH; Luo, HQ; Wen, HH

收藏 | 浏览/下载：106/0 | 提交时间：2015/04/14

incommensurate modulated structures high-resolution transmission electron microscopy electron-diffraction intensity correction phase extension

Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文 OAI收割
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China
Tan X.

收藏 | 浏览/下载：25/0 | 提交时间：2013/03/25

In ultraviolet spectroscopy groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order it is important to control the groove shape precisely so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method the required blaze angle is small we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides since the etched groove shape depends on the aspect ratio of the photoresist mask ridge if we wish to fabricate larger gratings with this method we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).

Effect of thickness on the structural, electrical and optical properties of ZnO films deposited by MBE (EI CONFERENCE) 会议论文 OAI收割
2011 International Conference on Advanced Design and Manufacturing Engineering, ADME 2011, September 16, 2011 - September 18, 2011, Guangzhou, China
Yang X.; Su S.; Yi X.; Mei T.

收藏 | 浏览/下载：25/0 | 提交时间：2013/03/25

A set of ZnO films of different thickness have been deposited on sapphire substrates using molecular beam epitaxy (MBE) by varying the growth time and the effect of film thickness on the structural electrical and optical properties have been investigated. The X-ray diffraction (XRD) results indicate that the full width at half maximum (FWHM) of the (002) diffraction peak is decreased as the film thickness increasing and the stress along c-axis is stable. Scanning electron microscope (SEM) measurement shows that the grains become more uniform as the film grows thicker and the film surface present distinct hexagon shape as the film is grown up to a thickness of 500nm. The optical absorbance Hall mobility and photoluminescence (PL) intensity are increased in accordance with the thickness of the film. (2011) Trans Tech Publications Switzerland.

Design and demonstration of micro multi-step mirrors and light source in micro FTIR (EI CONFERENCE) 会议论文 OAI收割
6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, February 20, 2011 - February 23, 2011, Kaohsiung, Taiwan
Liang Z.; Fu J.; Feng C.; Liang J.

收藏 | 浏览/下载：43/0 | 提交时间：2013/03/25

To obtain high resolution high signal-to-noise ratio (SNR) high reliability and real time in wide spectral range we study the space modulation Micro Fourier Transform Spectrometer (FTS) based on multi-step mirrors covering the spectral range of 3-5m and 8-12 m in theory and experiment. The influences of spectrum reconstruction caused by the diffraction and extended light source in Fourier Transform Infrared Spectrometer (FTIR) are analyzed. A method to reduce the noises in spectrum reconstruction and the relationship between coherent intensity and solid angle of light source are discussed. An extended light source with suitable size is chosen considering the requirement of SNR and spectrum resolving power in the optical design. Furthermore the fabrication of micro multi-step mirrors which is the core part of FTS is investigated. Three methods for fabricating multi-step micro mirrors are demonstrated. 2011 IEEE.

Mechanism of STED microscopy and analysis of the factors affecting resolution (EI CONFERENCE) 会议论文 OAI收割
6th International Symposium on Precision Engineering Measurements and Instrumentation, August 8, 2010 - August 11, 2010, Hangzhou, China
Yang P.; Ai H.

收藏 | 浏览/下载：23/0 | 提交时间：2013/03/25

Stimulated emission depletion (STED) microscopy exploits nonlinear saturable optical transition of fluorescent molecules allowed to overcome Abbe's diffraction-limit and provides diffraction-unlimited resolution in far-field optical microscopy. We elaborate the mechanism of STED and the conditions of depletion. The formula of STED microcopy resolution is deduced through effective point spread function (E-PSF). The STED system resolution is mainly dominated by the quality of the fluorescence depletion patterns in the focal plane. The depletion pattern is mainly affected by STED beam intensity polarization phase plate primary aberrations STED pulse shape pulse duration and delay time. In this paper we found related models and simulate the relationship between the depletion patterns and the parameters and put forward effective approach to enhance the system resolution. 2010 SPIE.

Autocollimation form dual-frequency laser diffraction grating interferometer design and analysis (EI CONFERENCE) 会议论文 OAI收割
2010 International Conference on Computer, Mechatronics, Control and Electronic Engineering, CMCE 2010, August 24, 2010 - August 26, 2010, Changchun, China
Wang C.-G.

收藏 | 浏览/下载：34/0 | 提交时间：2013/03/25

Propose a new measurement system of autocollimation form laser grating heterodyne interferometer. Take grating diffraction and polarization optics as theoretical foundation second furthermore combined with electronics knowledge to analyze the system. First make use of autocollimation diffraction of grating measurement information obtained by dual-frequency laser belongs to ac signal the interferometer measurement system take grating pitch as measuring datum the structure is simple possess great gain and high signal-noise ratio therefore stable completely overcome the disadvantages of DC level drift caused by light intensity variation of single-frequency laser system can achieve nanometer resolution. 2010 IEEE. reduce the impact of environmental factors easy to install and debug measurement error is small

Analysis of measuring errors for the visible light phase-shifting point diffraction interferometer (EI CONFERENCE) 会议论文 OAI收割
2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010, December 3, 2010 - December 6, 2010, Guangzhou, China
作者: Zhang Y.

收藏 | 浏览/下载：13/0 | 提交时间：2013/03/25

In order to improve the measuring accuracy of the visible light phase-shifting point diffraction interferometer (PS/PDI) for the extreme ultraviolet lithography (EUVL) aspheric mirrors the main measuring errors will be discussed in this paper. At first the elementary configuration and measuring principle of the visible light phase-shifting point diffraction interferometer are introduced briefly then the different errors which are possible to affect the measuring result are summed up the errors include PZT phase-shifting error detector nonlinearity error detector quantization error wavelength instability error and intensity instability error of the laser source vibration error air refractivity instability error and so on. Through detailed analysis and simulation the magnitude of these errors can be obtained. By analysing the reasons which cause these errors and the relationship between these errors and interferometer configuration parameters some methods are put forward to avoid or restrain these errors accordingly.