机构

• 上海微系统与信息技术... [2]
• 金属研究所 [1]
• 近代物理研究所 [1]

采集方式

• OAI收割 [4]

内容类型

• 期刊论文 [4]

发表日期

• 2019 [1]
• 2012 [2]
• 2006 [1]

学科主题

• Engineerin... [1]
• Materials ... [1]

筛选

浏览/检索结果: 共4条，第1-4条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择提交时间升序提交时间降序发表日期升序发表日期降序题名升序题名降序作者升序作者降序 Charge trapping effect in HfO2-based high-k gate dielectric stacks after heavy ion irradiation: The role of oxygen vacancy 期刊论文  OAI收割 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2019, 卷号: 459, 页码: 143-147 作者:  Li, Zongzhen;  Liu, Tianqi;  Bi, Jinshun;  Yao, Huijun;  Zhang, Zhenxing   |  收藏  |   Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition 期刊论文  OAI收割 VACUUM, 2012, 卷号: 86, 期号: 8, 页码: 1078-1082 Jin, CG; Yu, T; Bo, Y; Zhao, Y; Zhang, HY; Dong, YJ; Wu, XM; Zhuge, LJ; Ge, SB 收藏  |   Plasma enhanced atomic layer deposition of HfO2 with in situ plasma treatment 期刊论文  OAI收割 MICROELECTRONIC ENGINEERING, 2012, 卷号: 93, 页码: 15-18 Xu, DW; Cheng, XH; Zhang, YW; Wang, ZJ; Xia, C; Cao, D; Yu, YH; Shen, DS 收藏  |   Phase separation enhanced interfacial reactions in complex high-k dielectric films 期刊论文  OAI收割 Integrated Ferroelectrics, 2006, 卷号: 86, 页码: 13-19 X. Y. Qiu; F. Gao; H. W. Liu; J. S. Zhu; J. M. Liu 收藏  |