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	Critical-dimension scanning electron microscope characterization of smoothly varying wave structures with a Monte Carlo simulation 期刊论文 OAI收割 JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2021, 卷号: 54 作者: Khan, M. S. S.; Yang, L. H.; Deng, X.; Mao, S. F.; Zou, Y. B. \| 收藏 \| 浏览/下载：83/0 \| 提交时间：2021/09/06 linescan nano characterization CD-SEM Monte Carlo simulation atom lithography
	Analysis of measuring errors for the visible light phase-shifting point diffraction interferometer (EI CONFERENCE) 会议论文 OAI收割 2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010, December 3, 2010 - December 6, 2010, Guangzhou, China 作者: Zhang Y. 收藏 \| 浏览/下载：13/0 \| 提交时间：2013/03/25 In order to improve the measuring accuracy of the visible light phase-shifting point diffraction interferometer (PS/PDI) for the extreme ultraviolet lithography (EUVL) aspheric mirrors the main measuring errors will be discussed in this paper. At first the elementary configuration and measuring principle of the visible light phase-shifting point diffraction interferometer are introduced briefly then the different errors which are possible to affect the measuring result are summed up the errors include PZT phase-shifting error detector nonlinearity error detector quantization error wavelength instability error and intensity instability error of the laser source vibration error air refractivity instability error and so on. Through detailed analysis and simulation the magnitude of these errors can be obtained. By analysing the reasons which cause these errors and the relationship between these errors and interferometer configuration parameters some methods are put forward to avoid or restrain these errors accordingly.
	A design of beam shaping unit for 193nm lithography illumination system using angular spectrum theory (EI CONFERENCE) 会议论文 OAI收割 6th International Symposium on Precision Engineering Measurements and Instrumentation, August 8, 2010 - August 11, 2010, Hangzhou, China 作者: Zhao Y.; Zhang W.; Zhang W.; Li S. 收藏 \| 浏览/下载：17/0 \| 提交时间：2013/03/25 Off-axis illumination (OAI) technology is widely used to enhance resolution for deep ultraviolet lithography. The realizing methods of OAI include geometrical optics method and physical optics method. However the former has the disadvantage of weak intensity distribution controlling ability and the latter introduces simulation errors evidently when dealing with near field diffraction propagation. A diffractive optical element (DOE) designing method using plane wave angular spectrum theory is presented in this paper. Several kinds of OAI modes at near field away from DOE can be realized and simulation errors and the size of illuminator are also reduced. According to studying the relationships of the sampling point distance of DOE light beam propagation distance and the structure of the beam shaping unit a method of determining the designing parameters is discussed. Using this method several illumination modes are realized and simulation results show that all diffraction efficiencies reach up to 84%. The method of DOE manufacturing is analyzed at last and it is proven to be feasible. 2010 SPIE.
	Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method 期刊论文 OAI收割 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2009, 卷号: 8, 期号: 3, 页码: 13 作者: Zong, Ke; Zeng, Xuan; Ji, Xia; Cai, Wei \| 收藏 \| 浏览/下载：22/0 \| 提交时间：2018/07/30 lithography simulation phase-shifting mask spectral method eigen oscillations discontinuous Galerkin method Schwarz domain decomposition iteration
	Study of the contour-based optical proximity correction methodology 期刊论文 OAI收割 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2009, 卷号: 8, 期号: 4, 页码: 43005-43005 Zhu, L; Kang, XH; Gu, YL; Yang, S 收藏 \| 浏览/下载：34/0 \| 提交时间：2012/03/24 LITHOGRAPHY OPC SIMULATION DESIGN
	Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width 期刊论文 OAI收割 appl. optics, 2009, 卷号: 48, 期号: 2, 页码: 261, 269 Qiu Zicheng; 王向朝; Yuan Qiongyan; Wang Fan 收藏 \| 浏览/下载：1153/199 \| 提交时间：2009/09/18 LITHOGRAPHY SIMULATION ABERRATION MEASUREMENT PROJECTION OPTICS LENS ABERRATIONS TOOLS
	Periodic ZnO nanorod arrays defined by polystyrene microsphere self-assembled monolayers 期刊论文 OAI收割 NANO LETTERS, 2006, 卷号: 6, 期号: 10, 页码: 2375 Liu, DF; Xiang, YJ; Wu, XC; Zhang, ZX; Liu, LF; Song, L; Zhao, XW; Luo, SD; Ma, WJ; Shen, J; Zhou, WY; Wang, G; Wang, CY; Xie, SS 收藏 \| 浏览/下载：87/0 \| 提交时间：2013/09/24 NANOWIRE ARRAYS NANOSPHERE LITHOGRAPHY LARGE-SCALE NANOPARTICLES SIMULATION GROWTH