中国科学院机构知识库网格系统: 检索

Formation mechanism and microstructure evolution of light etched region during rolling contact fatigue in M50 steel 期刊论文 OAI收割
JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T, 2023, 卷号: 24, 页码: 8955-8966
作者: Lu, Xingyu; Zhou, Lina; Lei, Chengshuai; Liu, Hongwei; Lan, Huifang

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收藏 | 浏览/下载：6/0 | 提交时间：2024/01/07

M50 steel Rolling contact fatigue Light etching Microstructure evolution Finite element simulation

48 48 pixelated addressable full-color micro display based on flip-chip micro LEDs 期刊论文 OAI收割
Applied Optics, 2019, 卷号: 58, 期号: 31, 页码: 8383-8389
作者: Y.Li; J.Tao; Y.Zhao; J.Wang; J.Lv

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收藏 | 浏览/下载：25/0 | 提交时间：2020/08/24

Light emitting diodes,Color,Etching,Flip chip devices,Pixels,Substrates

Revealing the Role of Sidewall Orientation in Wet Chemical Etching of GaN-Based Ultraviolet Light-Emitting Diodes 期刊论文 OAI收割
Nanomaterials, 2019, 卷号: 9, 期号: 3, 页码: 8
作者: H.Wan; B.Tang; N.Li; S.J.Zhou; C.Q.Gui

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收藏 | 浏览/下载：26/0 | 提交时间：2020/08/24

GaN-based UV LED,wet chemical etching,prism-structured sidewall,crystal orientation,light extraction,efficiency,surface,plane,enhancement,extraction,layer,Science & Technology - Other Topics,Materials Science

Insights Into the Influence of Sidewall Morphology on the Light Extraction Efficiency of Mini-LEDs 期刊论文 OAI收割
Ieee Photonics Journal, 2019, 卷号: 11, 期号: 4, 页码: 7
作者: B.Tang; J.H.Miao; Y.C.Liu; S.J.Zhou; H.H.Xu

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收藏 | 浏览/下载：29/0 | 提交时间：2020/08/24

Light extraction efficiency,mini-LED,sidewall morphology,TMAH etching,emitting-diodes,enhancement,damage,layer,Engineering,Optics,Physics

Light-extraction enhancement of freestanding GaN-based flip-chip light-emitting diodes using two-step roughening methods 期刊论文 OAI收割
Journal of Semiconductors, 2013, 期号: 11, 页码: 53-56
作者: An TL(安铁雷); Sun B(孙波); Wei TB(魏同波); Zhao LX(赵丽霞); Duan RF(段瑞飞)

收藏 | 浏览/下载：20/0 | 提交时间：2015/12/25

freestanding GaN flip chip LED CsCl wet etching light extraction

Graphene-Like Carbon Nitride Nanosheets for Improved Photocatalytic Activities 期刊论文 OAI收割
Advanced Functional Materials, 2012, 卷号: 22, 期号: 22, 页码: 4763-4770
P. Niu; L. L. Zhang; G. Liu; H. M. Cheng

收藏 | 浏览/下载：93/0 | 提交时间：2013/02/05

g-C3N4 nanosheets thermal oxidation etching photocatalysis visible-light irradiation metal-free catalysts electronic-structure hydrogen-production semiconductor water conversion polymer oxide crystallinity

Key technologies on YAG laser engraving ceramic anilox roll 会议论文 OAI收割
2nd Annual Conference on Electrical and Control Engineering, ICECE 2011, Yichang, China, SEP 16-18, 2011
作者: Wang HC(王红才); Wang Y(王扬); Yang MJ(杨明江)

收藏 | 浏览/下载：28/0 | 提交时间：2013/04/11

Etching Light transmission Technology Ceramic anilox rolls Flexography High repetition Key technologies Laser cavity Laser engraving laser technique Laser texturing Light pulse tow-dimension controllable distribution YAG laser

Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文 OAI收割
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China
Tan X.

收藏 | 浏览/下载：25/0 | 提交时间：2013/03/25

In ultraviolet spectroscopy groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order it is important to control the groove shape precisely so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method the required blaze angle is small we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides since the etched groove shape depends on the aspect ratio of the photoresist mask ridge if we wish to fabricate larger gratings with this method we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).

Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine 期刊论文 OAI收割
ACTA PHYSICO-CHIMICA SINICA, 2009, 卷号: 25, 期号: 12, 页码: 2427-2432
作者: Li Wen; Leng Wen-Hua; Niu Zhen-Jiang; Li Xiang; Fei Hui

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收藏 | 浏览/下载：14/0 | 提交时间：2021/02/02

WO3 Electrochemical etching Fluorination Photoelectrochemistry Visible light

Enhanced Photoelectrochemical Performance of WO(3) Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine 期刊论文 OAI收割
Acta Physico-Chimica Sinica, 2009, 卷号: 25, 期号: 12, 页码: 2427-2432
W. Li; W. H. Leng; Z. J. Niu; X. Li; H. Fei; J. Q. Zhang; C. N. Cao

收藏 | 浏览/下载：20/0 | 提交时间：2012/04/13

WO(3) Electrochemical etching Fluorination Photoelectrochemistry Visible light tungsten-oxide degradation oxidation tio2 photocatalysts