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光电技术研究所 [4]
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OAI收割 [14]
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期刊论文 [10]
会议论文 [4]
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A pandemic-induced environmental dilemma of disposable masks: solutions from the perspective of the life cycle
期刊论文
OAI收割
ENVIRONMENTAL SCIENCE-PROCESSES & IMPACTS, 2022, 卷号: 24, 期号: 5, 页码: 649-674
作者:
Chen, Zigu
;
Zhang, Weican
;
Yang, Hang
;
Min, Ke
;
Jiang, Jie
  |  
收藏
  |  
浏览/下载:21/0
  |  
提交时间:2022/11/08
FACE MASKS
N95 MASKS
SELF-STERILIZATION
COVID-19
PLASTICS
MICROPLASTICS
PERFORMANCE
NANOFIBERS
SARS-COV-2
PROTECTION
Stretchable Electronic Facial Masks for Sonophoresis
期刊论文
OAI收割
ACS NANO, 2022, 卷号: 16, 期号: 4, 页码: 5961-5974
作者:
Li S(李爽)
;
Xu, Jingwen
;
Li, Rui
;
Wang YK(王永康)
;
Zhang MY(张懋熠)
  |  
收藏
  |  
浏览/下载:42/0
  |  
提交时间:2022/08/10
flexible electronics
stretchable electronics
facial masks
sonophoresis
transdermal drug delivery
Ultra-high-density silicon nanocone arrays with sharp tips by Ar+ sputtering at low temperature
期刊论文
OAI收割
SURFACE ENGINEERING, 2019, 卷号: 35, 期号: 1, 页码: 54—58
作者:
Wang, HJ
;
Li, QT
;
Wu, XJ
  |  
收藏
  |  
浏览/下载:30/0
  |  
提交时间:2019/12/30
FIELD-EMISSION PROPERTIES
ROOM-TEMPERATURE
ION-BOMBARDMENT
CONE ARRAYS
FABRICATION
PLASMA
FILMS
MICROTIPS
PILLARS
MASKS
Etching hard brittle optical materials by masked ion beam
会议论文
OAI收割
作者:
Li, Yun
;
Fu, Taotao
;
Jia, Xin
;
Xing, Tingwen
  |  
收藏
  |  
浏览/下载:22/0
  |  
提交时间:2018/12/20
Brittleness - Ions - Masks - Surface roughness
Batch Fabrication of Metasurface Holograms Enabled by Plasmonic Cavity Lithography
期刊论文
OAI收割
Advanced Optical Materials, 2017, 卷号: 5, 期号: 21, 页码: 1700429
作者:
Liu, Liqin
;
Zhang, Xiaohu
;
Zhao, Zeyu
;
Pu, Mingbo
;
Gao, Ping
  |  
收藏
  |  
浏览/下载:34/0
  |  
提交时间:2018/11/20
Electric fields - Electron beam lithography - Fabrication - Holography - Ion beams - Lithography - Masks - Nanostructures - Photoresists - Plasmons
Effect of fabrication errors of double-layer BOE on diffractive efficiency
期刊论文
OAI收割
hongwai yu jiguang gongcheng/infrared and laser engineering, 2016, 卷号: 45, 期号: 9
作者:
Ma, Zebin
;
Kang, Fuzeng
;
Wang, Hao
收藏
  |  
浏览/下载:33/0
  |  
提交时间:2016/11/07
Bins
Diffraction
Diffraction efficiency
Efficiency
Fabrication
Masks
MATLAB
Optical systems
Modeling and experimental study of plasmonic lens imaging with resolution enhanced methods
期刊论文
OAI收割
Optics Express, 2016, 卷号: 24, 期号: 24, 页码: 27115-27126
作者:
Zhao, Zeyu
;
Luo, Yunfei
;
Yao, Na
;
Zhang, Wei
;
Wang, Changtao
  |  
收藏
  |  
浏览/下载:31/0
  |  
提交时间:2018/06/14
Electric Fields
Masks
Nanolithography
Numerical Methods
Optical Transfer Function
Plasmons
Surface Plasmon Resonance
Sub-diffraction demagnification imaging lithography by hyperlens with plasmonic reflector layer
期刊论文
OAI收割
RSC Advances, 2016, 卷号: 6, 期号: 98, 页码: 95973-95978
作者:
Liu, Ling
;
Liu, Kaipeng
;
Zhao, Zeyu
;
Wang, Changtao
;
Gao, Ping
  |  
收藏
  |  
浏览/下载:20/0
  |  
提交时间:2018/06/14
Diffraction
Electric Field Effects
Electric Fields
Geometry
Masks
Plasmons
Reflection
Silver
Nanoscale patterns made by using a 13.5-nm Schwarzschild objective and a laser produced plasma source (EI CONFERENCE)
会议论文
OAI收割
Optical Micro- and Nanometrology IV, April 16, 2012 - April 18, 2012, Brussels, Belgium
作者:
Wang X.
;
Wang X.
;
Wang X.
;
Wang Z.
;
Wang Z.
收藏
  |  
浏览/下载:37/0
  |  
提交时间:2013/03/25
Lithium fluoride (LiF) crystal is a very promising candidate as nanometer resolution EUV and soft X-ray detector. Compared with other EUV and soft X-ray detectors
charge coupled device and photographic films
LiF crystal has high resolution
large field of view and wide dynamic range. In this paper
using LiF crystal as EUV detector and a Schwarzschild objective (SO) working at 13.5nm as projection optics
mesh images with 4.2 m
1.2 m and 800 nm line width and pinhole patterns with 1.5m diameter are acquired in projection imaging mode and direct writing mode
respectively. Fluorescence intensity profiles of images show that the resolution of mesh image is 900 nm
and the one of pinhole image is 800 nm. In the experiments
a spherical condense mirror based on normal incidence type is used to eliminate the damage and contamination on the masks (mesh and pinhole) caused by the laser plasma
and the energy density is not decreased compared with that the masks are close to the plasma. The development of the SO
the alignment of the objective and the imaging experiments are also reported. 2012 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
ACCURATE SIMULATIONS OF 2-D PHASE SHIFT MASKS WITH A GENERALIZED DISCONTINUOUS GALERKIN (GDG) METHOD
期刊论文
OAI收割
DISCRETE AND CONTINUOUS DYNAMICAL SYSTEMS-SERIES B, 2011, 卷号: 15, 期号: 2, 页码: 401-415
作者:
Ji, Xia
;
Cai, Wei
  |  
收藏
  |  
浏览/下载:17/0
  |  
提交时间:2018/07/30
Generalized discontinuous Galerkin method (GDG)
discontinuous Galerkin method (DG)
phase shift masks (PSM)
perfectly matched layer (PML)