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浏览/检索结果: 共11条,第1-10条 帮助

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A surface shape test method for a thin flat mirror 期刊论文  OAI收割
OPTIK, 2018, 卷号: 152, 页码: 116-126
作者:  
Guo, Yongwei
  |  收藏  |  浏览/下载:34/0  |  提交时间:2018/06/08
STEP Mission: Search for Terrestrial Exo-Planets 会议论文  OAI收割
European Planetary Science Congress 2013,, London, UK, 2013
Chen D.; Wu; J.; Li B.
收藏  |  浏览/下载:35/0  |  提交时间:2014/04/30
Influence of spatial temperature distribution on high accuracy interferometric metrology (EI CONFERENCE) 会议论文  OAI收割
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, April 26, 2010 - April 29, 2010, Dalian, China
作者:  
Yang H.;  Zhang J.;  Zhang J.;  Zhang J.;  Yan F.
收藏  |  浏览/下载:29/0  |  提交时间:2013/03/25
We calculate the influence of temperature change on the refractive index of air  establish a model of air temperature distribution and analyze the effect of different temperature distribution on the high accuracy interferometric metrology. First  a revised Edlen formula is employed to acquire the relation between temperature and refractive index of air  followed by introducing the fixed temperature gradient distribution among the spatial grid within the optical cavity between the reference flat and the test flat of the Fizeau interferometer  accompanied by a temperature change random function within each grid. Finally  all the rays through the air layer with different incident angles are traced by Matlab program in order to obtain the final output position  angle and OPD for each ray. The influence of different temperature distribution and the length of the optical cavity in on the testing accuracy can be analyzed through the RMS value that results from repeatable rays tracing. As a result  the horizontal distribution (vertical to optical axis) has a large effect on the testing accuracy. Thus  to realize the high accuracy figure metrology  the horizontal distribution of temperature must be rigorously controlled as well as to shorten the length of the optical cavity to a large extent. The results from our simulation are of great significant for the accuracy analysis of interferometric testing and the research of manufacturing a interferometer. 2010 Copyright SPIE - The International Society for Optical Engineering.  
Three dimensional profilometry using Dammann grating 期刊论文  OAI收割
applied optics, 2009, 卷号: 48, 期号: 19, 页码: 3709
J. Zhang; Changhe Zhou; X. Wang
收藏  |  浏览/下载:1672/356  |  提交时间:2010/05/13
基于基频分量消光的1/4波片快轴标定方法 期刊论文  OAI收割
中国激光, 2007, 卷号: 34, 期号: 11, 页码: 1553, 1556
杨坤; 曾爱军; 王向朝; 王华
收藏  |  浏览/下载:1143/173  |  提交时间:2009/09/18
一种步进扫描投影光刻机承片台不平度检测新技术 期刊论文  OAI收割
光学学报, 2007, 卷号: 27, 期号: 7, 页码: 1205, 1210
何乐; 王向朝; 王帆; 施伟杰; 马明英
收藏  |  浏览/下载:763/180  |  提交时间:2009/09/18
基于高频微波技术的分布式光纤传感器布里渊散射信号检测 期刊论文  OAI收割
中国激光, 2007, 卷号: 34, 期号: 4, 页码: 503, 506
孙安; 陈嘉琳; 李国扬; 王利; 常丽萍; 林尊琪
收藏  |  浏览/下载:1176/224  |  提交时间:2009/09/18
The application of auto-controlled liquid crystal light valve arrays to photolithography shutter (EI CONFERENCE) 会议论文  OAI收割
ICO20: Optical Devices and Instruments, August 21, 2005 - August 26, 2005, Changchun, China
作者:  
Chen Y.
收藏  |  浏览/下载:16/0  |  提交时间:2013/03/25
Photolithography shutter is usually used to control exposure in order to obtain patterns of code disc and metrology grating which are the core components of optical shaft encoder. But perforated film as photolithography shutter has many disadvantages such as taking too long time to perforate  easily making wrong code  lower reusable ratio. Mathematical models for resist property  luminous efficiency and exposure have been established by deducing their relations for avoiding the disadvantages  which provides the theory of using liquid crystal light valve (LCLV) replacing proforated film. Based on operating principles of LCLV and control theories of photolithography shutter  the principle diagram of control circuit of LCLV arrays has been designed according to theirs control principles. In the control system  LCLV arrays as photolithography shutter are realized by adopting DS75451 to drive them and using AT89C51 chip to control them. By photolithographic experiment  the patterns of code disc are good  the edges of lines are vertical  it indicates LCLV arrays as photolithography shutter may control exposure and light passing accords with the intending requires. It proves using LCLV arrays replacing perforated film as photolithography shutter is feasible completely.  
基于光栅成像投影的微位移检测方法 期刊论文  OAI收割
中国激光, 2005, 卷号: 32, 期号: 3, 页码: 394, 398
曾爱军; 王向朝
收藏  |  浏览/下载:1386/223  |  提交时间:2009/09/18
A novel method to determine the FOCAL energy range 期刊论文  OAI收割
chin. opt. lett., 2005, 卷号: 3, 期号: 10, 页码: 589, 592
Dongqing Zhang; 王向朝; Weijie Shi
收藏  |  浏览/下载:1575/267  |  提交时间:2009/09/18