中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
机构
采集方式
内容类型
发表日期
学科主题
筛选

浏览/检索结果: 共10条,第1-10条 帮助

条数/页: 排序方式:
Charge trapping effect in HfO2-based high-k gate dielectric stacks after heavy ion irradiation: The role of oxygen vacancy 期刊论文  OAI收割
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2019, 卷号: 459, 页码: 143-147
作者:  
Li, Zongzhen;  Liu, Tianqi;  Bi, Jinshun;  Yao, Huijun;  Zhang, Zhenxing
  |  收藏  |  浏览/下载:27/0  |  提交时间:2022/01/19
Bi quantum dots on rutile TiO2 as hole trapping centers for efficient photocatalytic bromate reduction under visible light illumination 期刊论文  OAI收割
ELSEVIER SCIENCE BV, 2017, 卷号: 218, 页码: 111-118
作者:  
Xiao, Jun;  Yang, Weiyi;  Li, Qi;  Li, Q (reprint author), Chinese Acad Sci, Inst Met Res, Environm Funct Mat Div, Shenyang Natl Lab Mat Sci, Shenyang 110016, Liaoning, Peoples R China.
  |  收藏  |  浏览/下载:21/0  |  提交时间:2018/01/10
Semi-closed tubular light-trapping geometry dye sensitized solar cells with stable efficiency in wide light intensity range 期刊论文  OAI收割
JOURNAL OF POWER SOURCES, 2014, 卷号: 261, 页码: 75-85
作者:  
  |  收藏  |  浏览/下载:30/0  |  提交时间:2019/04/09
A review of nanographene: growth and applications 期刊论文  OAI收割
MODERN PHYSICS LETTERS B, 2014, 卷号: 28, 期号: 20
Meng, JL; Shi, DX; Zhang, GY
收藏  |  浏览/下载:38/0  |  提交时间:2015/04/14
Charge-trapping effect of doped fluorescent dye on the electroluminescent processes and its performance in polymer light-emitting diodes 期刊论文  OAI收割
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2010, 卷号: 175, 期号: 1, 页码: 75-80
作者:  
Ye, Tengling;  Chen, Zhenyu;  Chen, Jiangshan;  Ma, Dongge
  |  收藏  |  浏览/下载:58/0  |  提交时间:2019/04/09
Study on the pre-chopper in CSNS LEBT 期刊论文  OAI收割
CHINESE PHYSICS C, 2010, 卷号: 34, 期号: 8, 页码: 1122-1126
作者:  
欧阳华甫;  Zhang HS(张华顺);  Gong KY(巩克云);  Liu HC(刘华昌);  Wu XB(吴小兵)
收藏  |  浏览/下载:36/0  |  提交时间:2016/06/29
Study on the pre-chopper in CSNS LEBT 期刊论文  OAI收割
中国物理C, 中国物理C, 2010, 2010, 期号: 8, 页码: 1122-1126, 1122-1126
作者:  
欧阳华甫;  Zhang HS(张华顺);  Gong KY(巩克云);  Liu HC(刘华昌);  Wu XB(吴小兵)
  |  收藏  |  浏览/下载:32/0  |  提交时间:2015/12/14
The effect of N/Si ratio on the a-SiiH/SiNx interface of a-SirH/SiNx TFT (EI CONFERENCE) 会议论文  OAI收割
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Liu J. e.; Gao W.; Liao Y.; Jing H.; Fu G.
收藏  |  浏览/下载:24/0  |  提交时间:2013/03/25
The threshold voltage of a-Si: H/SiNx TFT will shift under long time gate bias stress  it is mostly leaded by charge trapping in gate insulator and defect creation in semiconductor. And it is hard to be applied in AMOLED for TFT because of its threshold voltage shift. In allusion to the phenomenon of charge trapping  a series of SiNx insulating films in different N/Si(0. 87 -1.68) ratio were deposited by PECVD in this paper  controlling different flow ratio of source gas SiH4 and NH3  and a great deal of tests (ellipsometer  infrared absorption (FTIR) and Electron Dispersion Spectrum (EDS) test ) were done on these samples. Based on these SiNx insulators  three different capacitance samples in MIS structure were done  degraded experiments and C-V tests on these samples were done. The C-V curve shift of capacitance which contained SiNx with slightly N-rich(N/Si is bigger slightly than 1. 33) was not evident before and after degradation  this result indicated that the defect density of this type SiN x was smaller  and could restrain charge chapping in the interface of a-Si:H/SiNx effectively. So that as gate insulator of TFT  SiN x with slightly N-rich could decrease the threshold voltage shift of TFT and enhance its stability effectively.  
Study on the instability of organic field-effect transistors based on fluorinated copper phthalocyanine 期刊论文  OAI收割
thin solid films, 2004, 卷号: 450, 期号: 2, 页码: 316-319
Yuan JF; Zhang JD; Wang J; Yan DH; Xu W
收藏  |  浏览/下载:153/31  |  提交时间:2010/08/17
Influence of fluorine on radiation-induced charge trapping in the SIMOX buried oxides 会议论文  OAI收割
7th international conference on solid-state and integrated circuits technology, beijing, peoples r china, oct 18-21, 2004
Zhang, GQ; Liu, ZL; Li, N; Zhen, ZS; Liu, GH; Lin, Q; Zhang, ZX; Lin, CL
收藏  |  浏览/下载:149/31  |  提交时间:2010/03/29