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化学研究所 [2]
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OAI收割 [10]
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期刊论文 [8]
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Charge trapping effect in HfO2-based high-k gate dielectric stacks after heavy ion irradiation: The role of oxygen vacancy
期刊论文
OAI收割
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2019, 卷号: 459, 页码: 143-147
作者:
Li, Zongzhen
;
Liu, Tianqi
;
Bi, Jinshun
;
Yao, Huijun
;
Zhang, Zhenxing
  |  
收藏
  |  
浏览/下载:27/0
  |  
提交时间:2022/01/19
High-k HfO2
Heavy ion irradiation
Reliability
Charge trapping
Oxygen vacancy
Bi quantum dots on rutile TiO2 as hole trapping centers for efficient photocatalytic bromate reduction under visible light illumination
期刊论文
OAI收割
ELSEVIER SCIENCE BV, 2017, 卷号: 218, 页码: 111-118
作者:
Xiao, Jun
;
Yang, Weiyi
;
Li, Qi
;
Li, Q (reprint author), Chinese Acad Sci, Inst Met Res, Environm Funct Mat Div, Shenyang Natl Lab Mat Sci, Shenyang 110016, Liaoning, Peoples R China.
  |  
收藏
  |  
浏览/下载:21/0
  |  
提交时间:2018/01/10
Bi Quantum Dots
Photocatalytic Bromate Reduction
Visible Light
Hole Trapping/consumption Center
Charge Carrier Separation
Semi-closed tubular light-trapping geometry dye sensitized solar cells with stable efficiency in wide light intensity range
期刊论文
OAI收割
JOURNAL OF POWER SOURCES, 2014, 卷号: 261, 页码: 75-85
作者:
  |  
收藏
  |  
浏览/下载:30/0
  |  
提交时间:2019/04/09
Dye Sensitized Solar Cell
Tube Structure
Light-trapping
Light Intensity
Charge Transport
Heat Dissipation
A review of nanographene: growth and applications
期刊论文
OAI收割
MODERN PHYSICS LETTERS B, 2014, 卷号: 28, 期号: 20
Meng, JL
;
Shi, DX
;
Zhang, GY
收藏
  |  
浏览/下载:38/0
  |  
提交时间:2015/04/14
Nanographene direct growth
strain sensor
resistance random access memory
charge trapping memory
Charge-trapping effect of doped fluorescent dye on the electroluminescent processes and its performance in polymer light-emitting diodes
期刊论文
OAI收割
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2010, 卷号: 175, 期号: 1, 页码: 75-80
作者:
Ye, Tengling
;
Chen, Zhenyu
;
Chen, Jiangshan
;
Ma, Dongge
  |  
收藏
  |  
浏览/下载:58/0
  |  
提交时间:2019/04/09
Charge-trapping
Energy Transfer
Light-emitting Diodes
Study on the pre-chopper in CSNS LEBT
期刊论文
OAI收割
CHINESE PHYSICS C, 2010, 卷号: 34, 期号: 8, 页码: 1122-1126
作者:
欧阳华甫
;
Zhang HS(张华顺)
;
Gong KY(巩克云)
;
Liu HC(刘华昌)
;
Wu XB(吴小兵)
收藏
  |  
浏览/下载:36/0
  |  
提交时间:2016/06/29
LEBT
pre-chopper
charge neutralization
deflecting voltage
electron-trapping
loaded capacitance
Study on the pre-chopper in CSNS LEBT
期刊论文
OAI收割
中国物理C, 中国物理C, 2010, 2010, 期号: 8, 页码: 1122-1126, 1122-1126
作者:
欧阳华甫
;
Zhang HS(张华顺)
;
Gong KY(巩克云)
;
Liu HC(刘华昌)
;
Wu XB(吴小兵)
  |  
收藏
  |  
浏览/下载:32/0
  |  
提交时间:2015/12/14
LEBT
pre-chopper
charge neutralization
deflecting voltage
electron-trapping
loaded capacitance
LEBT
pre-chopper
charge neutralization
deflecting voltage
electron-trapping
loaded capacitance
The effect of N/Si ratio on the a-SiiH/SiNx interface of a-SirH/SiNx TFT (EI CONFERENCE)
会议论文
OAI收割
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Liu J. e.
;
Gao W.
;
Liao Y.
;
Jing H.
;
Fu G.
收藏
  |  
浏览/下载:24/0
  |  
提交时间:2013/03/25
The threshold voltage of a-Si: H/SiNx TFT will shift under long time gate bias stress
it is mostly leaded by charge trapping in gate insulator and defect creation in semiconductor. And it is hard to be applied in AMOLED for TFT because of its threshold voltage shift. In allusion to the phenomenon of charge trapping
a series of SiNx insulating films in different N/Si(0. 87 -1.68) ratio were deposited by PECVD in this paper
controlling different flow ratio of source gas SiH4 and NH3
and a great deal of tests (ellipsometer
infrared absorption (FTIR) and Electron Dispersion Spectrum (EDS) test ) were done on these samples. Based on these SiNx insulators
three different capacitance samples in MIS structure were done
degraded experiments and C-V tests on these samples were done. The C-V curve shift of capacitance which contained SiNx with slightly N-rich(N/Si is bigger slightly than 1. 33) was not evident before and after degradation
this result indicated that the defect density of this type SiN x was smaller
and could restrain charge chapping in the interface of a-Si:H/SiNx effectively. So that as gate insulator of TFT
SiN x with slightly N-rich could decrease the threshold voltage shift of TFT and enhance its stability effectively.
Study on the instability of organic field-effect transistors based on fluorinated copper phthalocyanine
期刊论文
OAI收割
thin solid films, 2004, 卷号: 450, 期号: 2, 页码: 316-319
Yuan JF
;
Zhang JD
;
Wang J
;
Yan DH
;
Xu W
收藏
  |  
浏览/下载:153/31
  |  
提交时间:2010/08/17
THIN-FILM TRANSISTORS
CHARGE TRAPPING INSTABILITIES
TRANSPORT
Influence of fluorine on radiation-induced charge trapping in the SIMOX buried oxides
会议论文
OAI收割
7th international conference on solid-state and integrated circuits technology, beijing, peoples r china, oct 18-21, 2004
Zhang, GQ
;
Liu, ZL
;
Li, N
;
Zhen, ZS
;
Liu, GH
;
Lin, Q
;
Zhang, ZX
;
Lin, CL
收藏
  |  
浏览/下载:149/31
  |  
提交时间:2010/03/29
fluorine
SIMOX
charge trapping
radiation
SIO2