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浏览/检索结果: 共46条，第1-10条 帮助

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Multi-layered all-dielectric grating visible color filter with a narrow band and high-quality factor 期刊论文  OAI收割
Optics Express, 2022, 卷号: 30, 期号: 13, 页码: 22820-22829
作者:  Y. H. Zhao;  Z. Z. Li;  X. Y. Liu;  K. Wang;  Y. Q. Sun
  |  收藏  |  浏览/下载：3/0  |  提交时间：2023/06/14
Effects of yttrium on wettability and interactions between molten superalloy and SiO2-based ceramic core 期刊论文  OAI收割
CERAMICS INTERNATIONAL, 2020, 卷号: 46, 期号: 6, 页码: 7324-7335
作者:  Zi, Yun;  Meng, Jie;  Zou, Mingke;  Xu, Wei;  Li, Jinguo
  |  收藏  |  浏览/下载：29/0  |  提交时间：2021/02/02
Oxidation mechanism and kinetics of SiBCN/HfC ceramic composites at high temperatures 期刊论文  OAI收割
JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T, 2020, 期号: 2, 页码: 2289
作者:  Wei, YQ;  Yang, Y;  Liu, M;  Li, QL
  |  收藏  |  浏览/下载：20/0  |  提交时间：2020/12/23
Charge trapping effect in HfO2-based high-k gate dielectric stacks after heavy ion irradiation: The role of oxygen vacancy 期刊论文  OAI收割
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2019, 卷号: 459, 页码: 143-147
作者:  Li, Zongzhen;  Liu, Tianqi;  Bi, Jinshun;  Yao, Huijun;  Zhang, Zhenxing
  |  收藏  |  浏览/下载：15/0  |  提交时间：2022/01/19
Annealing-induced evolution in interface stability and electrical performance of sputtering-driven rare-earth-based gate oxides 期刊论文  OAI收割
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 778, 期号: 无, 页码: 579-587
作者:  Wang, Die;  He, Gang;  Liang, Shuang;  Liu, Mao
  |  收藏  |  浏览/下载：63/0  |  提交时间：2020/03/31
Performance Enhancement for Charge Trapping Memory by Using Al2O3/HfO2/Al2O3 Tri-Layer High-k Dielectrics and High Work Function Metal Gate 期刊论文  OAI收割
ECS Journal of Solid State Science and Technology, 2018
作者:  Hou CZ(侯朝昭)
  |  收藏  |  浏览/下载：23/0  |  提交时间：2019/05/05
Interface Modulation and Optimization of Electrical Properties of HfGdO/GaAs Gate Stacks by ALD-Derived Al2O3 Passivation Layer and Forming Gas Annealing 期刊论文  OAI收割
ADVANCED ELECTRONIC MATERIALS, 2018, 卷号: 4, 期号: 4, 页码: 9
作者:  Jiang, Shanshan;  He, Gang;  Liu, Mao;  Zhu, Li;  Liang, Shuang
  |  收藏  |  浏览/下载：65/0  |  提交时间：2019/06/10
Interface chemistry and electronic structure of ALD-derived HfAlO/Ge gate stacks revealed by X-ray photoelectron spectroscopy 期刊论文  OAI收割
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 716, 期号: 无, 页码: 1-6
作者:  He, Gang;  Jiang, Shanshan;  Li, Wendong;  Zheng, Changyong;  He, Huaxin
收藏  |  浏览/下载：38/0  |  提交时间：2018/05/25
Modulation of interfacial and electrical properties of HfGdO/GaAs gate stacks by ammonium sulfide passivation and rapid thermal annealing 期刊论文  OAI收割
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 704, 期号: 无, 页码: 322-328
作者:  Jiang, S. S.;  He, G.;  Liang, S.;  Zhu, L.;  Li, W. D.
收藏  |  浏览/下载：20/0  |  提交时间：2018/07/04
Interfacial modulation and electrical properties improvement of solution-processed ZrO2 gate dielectrics upon Gd incorporation 期刊论文  OAI收割
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 699, 期号: 无, 页码: 415-420
作者:  Xiao, D. Q.;  He, G.;  Lv, J. G.;  Wang, P. H.;  Liu, M.
收藏  |  浏览/下载：14/0  |  提交时间：2018/07/04