机构

• 半导体研究所 [3]
• 苏州纳米技术与纳米仿... [1]
• 上海技术物理研究所 [1]
• 合肥物质科学研究院 [1]

采集方式

• OAI收割 [4]
• iSwitch采集 [2]

内容类型

• 期刊论文 [6]

发表日期

• 2020 [1]
• 2013 [1]
• 2008 [3]
• 2007 [1]

学科主题

• 半导体材料 [1]

筛选

浏览/检索结果: 共6条，第1-6条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Improvement of GaN plasma etching uniformity by optimizing the coil electrode with plasma simulation and experimental validation 期刊论文  OAI收割 SURFACE & COATINGS TECHNOLOGY, 2020, 卷号: 400 作者:  Xiao, Dezhi;  Ruan, Qingdong;  Liu, Liangliang;  Shen, Jie;  Cheng, Cheng   |  收藏  |  浏览/下载：29/0  |  提交时间：2020/11/26 GaN  Plasma etching  Inductively-coupled plasma  Field coupling  Uniformity  Plasma simulation   Investigations on a Multiple Mask Technique to Depress Processing-Induced Damage of ICP-Etched HgCdTe Trenches 期刊论文  OAI收割 J. Electron. Mater, 2013, 卷号: 42, 期号: 11 Z.H. YE; W.D. HU; W. LEI; W. LU; L. HE; L. YANG; P. ZHANG; Y. HUANG; C. LIN; C.H. SUN; X.N. HU; R.J. DING; X.S. CHEN 收藏  |  浏览/下载：23/0  |  提交时间：2014/11/11 Mercury cadmium telluride (HgCdTe)  processing-induced side-wall damage  inductively coupled plasma (ICP)  high etching selectivity   Loss-Reduction in Flexibly Vertical Coupled Ring Lasers Through Asymmetric Double Shallow Ridge and ICP/ICP Cascade Etching 期刊论文  OAI收割 IEEE PHOTONICS TECHNOLOGY LETTERS, 2008, 卷号: 20, 期号: 21-24, 页码: 1821-1823 作者:  Zhang R(张瑞英) 收藏  |  浏览/下载：13/0  |  提交时间：2010/01/15 Active vertical coupler (AVC)  asymmetrical double shallow ridge  inductively coupled plasma (ICP)/ICP etching  rectangular ring laser   Improvement of the performance of gan-based leds grown on sapphire substrates patterned by wet and icp etching 期刊论文  iSwitch采集 Solid-state electronics, 2008, 卷号: 52, 期号: 6, 页码: 962-967 作者:  Gao, Haiyong;  Yan, Fawang;  Zhang, Yang;  Li, Jinmin;  Zeng, Yiping 收藏  |  浏览/下载：27/0  |  提交时间：2019/05/12 Ingan/gan multiple quantum wells  Light-emitting diode  Wet etching  Inductively coupled plasma etching   Improvement of the performance of GaN-based LEDs grown on sapphire substrates patterned by wet and ICP etching 期刊论文  OAI收割 solid-state electronics, 2008, 卷号: 52, 期号: 6, 页码: 962-967 Gao, HY; Yan, FW; Zhang, Y; Li, JM; Zeng, YP; Wang, GH 收藏  |  浏览/下载：69/4  |  提交时间：2010/03/08 InGaN/GaN multiple quantum wells  light-emitting diode  wet etching  inductively coupled plasma etching   Inductively coupled plasma etching of two-dimensional inp/ingaasp-based photonic crystal 期刊论文  iSwitch采集 Acta physica sinica, 2007, 卷号: 56, 期号: 2, 页码: 977-981 作者:  Ma Xiao-Tao;  Zheng Wan-Hua;  Ren Gang;  Fan Zhong-Chao;  Chen Chang-Hui 收藏  |  浏览/下载：32/0  |  提交时间：2019/05/12 Two-dimensional photonic crystal  Inp/ingaasp  Inductively coupled plasma  C-2/bcl3  Low bias etching