机构

• 金属研究所 [9]
• 兰州化学物理研究所 [3]
• 长春光学精密机械与物... [1]

采集方式

• OAI收割 [13]

内容类型

• 期刊论文 [12]
• 会议论文 [1]

发表日期

• 2018 [2]
• 2015 [1]
• 2014 [1]
• 2010 [1]
• 2008 [4]
• 2003 [3]
• 更多

学科主题

• 材料科学与物理化学 [3]

筛选

浏览/检索结果: 共13条，第1-10条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films 期刊论文  OAI收割 RARE METAL MATERIALS AND ENGINEERING, 2018, 卷号: 47, 期号: 11, 页码: 3284-3288 作者:  Zhao Yanhui;  Zhao Shengsheng;  Ren Ling;  Denisov, V. V.;  Koval, N. N.   |  收藏  |  浏览/下载：10/0  |  提交时间：2021/02/02 arc ion plating  magnetic field  pulse bias  microstructure  mechanical property   Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films 期刊论文  OAI收割 RARE METAL MATERIALS AND ENGINEERING, 2018, 卷号: 47, 期号: 11, 页码: 3284-3288 作者:  Zhao Yanhui;  Zhao Shengsheng;  Ren Ling;  Denisov, V. V.;  Koval, N. N.   |  收藏  |  浏览/下载：12/0  |  提交时间：2021/02/02 arc ion plating  magnetic field  pulse bias  microstructure  mechanical property   直流法制备类富勒烯碳氢薄膜的摩擦学性能研究 期刊论文  OAI收割 摩擦学学报, 2015, 卷号: 35, 期号: 1, 页码: 82-89 作者:  欧玉静;  郭俊猛;  王永富;  高凯雄;  梁爱民 收藏  |  浏览/下载：39/0  |  提交时间：2016/01/20 直流  类富勒烯  脉冲偏压协助  低敏感性  direct current  fullerene-like  pulse bias-assisted  low sensitivity   Exchange Bias Effect and Magnetic Properties in La0.7Sr0.3MnO3-NiO Nanocomposite Films 期刊论文  OAI收割 Ieee Transactions on Magnetics, 2014, 卷号: 50, 期号: 1 X. K. Ning; Z. J. Wang; X. G. Zhao; C. W. Shih; W. C. Chang; Z. D. Zhang 收藏  |  浏览/下载：33/0  |  提交时间：2014/02/19 Exchange bias (EB)  magnetic transport properties  pulse laser  deposition (PLD)  low-field magnetoresistance  magnetotransport properties  thin-films  composite   Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating 期刊论文  OAI收割 Surface & Coatings Technology, 2010, 卷号: 204, 期号: 11, 页码: 1800-1810 X. S. Wan; S. S. Zhao; Y. Yang; J. Gong; C. Sun 收藏  |  浏览/下载：21/0  |  提交时间：2012/04/13 Arc ion plating  Cr-N coating  Nitrogen pressure  Pulse bias voltage  chromium nitride films  thin-films  cathodic vacuum  tin  behavior  stress  macroparticles  evaporation  plasma  charge   The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films 期刊论文  OAI收割 Surface and Coatings Technology, 2008, 卷号: 202, 页码: 2684-2689 作者:  Wang P(王鹏);  Zhang JY(张俊彦);  Wang LP(王立平);  Zhang GA(张广安) 收藏  |  浏览/下载：58/0  |  提交时间：2013/03/28 Al-containing hydrogenated amorphous carbon  Magnetron sputtering  Applied substrate pulse bias  Hardness  Wear test   Fabrication of nanopatterns on H-passivated Si surface by AFM local anodic oxidation 期刊论文  OAI收割 Physica E, 2008, 卷号: 41, 页码: 146-149 莫宇飞; 王莹; 白明武 收藏  |  浏览/下载：20/0  |  提交时间：2013/03/28 Nanopattern  Local anodic oxidation  Atomic force microscopy  Pulse bias voltage   Characteristics of ZnMgO-based metal-semiconductor-metal photodetectors (EI CONFERENCE) 会议论文  OAI收割 International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Photoelectronic Imaging and Detection, September 9, 2007 - September 12, 2007, Beijing, China 作者:  Zhang J.;  Li B.;  Li B.;  Li B.;  Zhao Y. 收藏  |  浏览/下载：23/0  |  提交时间：2013/03/25 In recent years  ZnMgO semiconductor alloys  with a direct bandgap tunable between 3.37 eV and 7.8 eV  become one of the most suitable materials for the fabrication of ultraviolet detectors. In this paper  we have fabricated metal-semiconductor-metal photodetectors on 1-m thick Zn 0.8Mg0.2O films. The interdigital metal electrodes are 500 m long and 5 m wide with an interelectrode spacing 2 m  5 m and 10 m  respectively. Zn0.8Mg0.2O films were grown on quartz by ratio frequency magnetron sputtering at 500C. Dark current  spectral responsivity and pulse response were carried out for the devices with different finger pitches. All the photodetectors showed the peak responsivity at 330 nm and the ultraviolet-visible rejection ratio (R330 nm/R400 nm) is more than four orders of magnitude at 3 V bias. For the device with 2 m finger pitch  the detectivity was calculated as 4.21011 cm Hz 1/2/W at 330 nm. Furthermore  the transient response measurement for all devices revealed similar rise time of 10 ns. The 90%-10% fall times are 130 ns  170 ns and 230 ns for the devices with different finger pitches of 2 m  5 m and 10 m  respectively..   Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics 期刊论文  OAI收割 Journal of Vacuum Science & Technology A, 2008, 卷号: 26, 期号: 5, 页码: 1258-1266 Q. M. Wang; K. H. Kim 收藏  |  浏览/下载：20/0  |  提交时间：2012/04/13 chromium nitride films  hybrid coating system  structure zone model  si-n coatings  mechanical-properties  tin films  thin-films  pulse bias  vacuum  evaporation   Microstructure and hardness of chromium oxide coatings by arc ion plating 期刊论文  OAI收割 ACTA METALLURGICA SINICA, 2003, 卷号: 39, 期号: 9, 页码: 979-983 作者:  Ji, AL;  Wang, W;  Song, GH;  Wang, AY;  Sin, C   |  收藏  |  浏览/下载：12/0  |  提交时间：2021/02/02 Cr2O3 thin film  arc ion plating  microstructure  pulse bias voltage