中国科学院机构知识库网格系统: 检索

Structure and thickness-dependent gas sensing responses to NO2 under UV irradiation for the multilayered ZnO micro/nanostructured porous thin films 期刊论文 OAI收割
JOURNAL OF COLLOID AND INTERFACE SCIENCE, 2017, 卷号: 503, 期号: 无, 页码: 150-158
作者: Su, Xingsong; Duan, Guotao; Xu, Zongke; Zhou, Fei; Cai, Weiping

收藏 | 浏览/下载：33/0 | 提交时间：2018/06/04

Multilayered Micro/nanostructured Porous Thin Films Uv Irradiation Gas Sensing Responses Effects Of Porous Structure And Film Thickness

Performance Investigation of Multilayer MoS2 Thin-Film Transistors Fabricated via Mask-free Optically Induced Electrodeposition 期刊论文 OAI收割
ACS Applied Materials and Interfaces, 2017, 卷号: 9, 期号: 9, 页码: 8361-8370
作者: Li M(李萌); Liu N(刘娜); Li P(李盼); Shi JL(施佳林); Li GY(李广勇)

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收藏 | 浏览/下载：17/0 | 提交时间：2017/03/26

Mask-free Fabrication Metal-contact Surface Multilayer Mos2 Thickness Of Mos2 Film Thin-film Transistors

MgO SECONDARY ELECTRON EMISSION FILM PREPARED BY RADIO-FREQUENCY REACTIVE SPUTERRING 期刊论文 OAI收割
ACTA METALLURGICA SINICA, 2016, 卷号: 52, 期号: 1, 页码: 10-16
作者: Wang Bin; Xong Liangyin; Liu Shi

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收藏 | 浏览/下载：7/0 | 提交时间：2021/02/02

radio-frequency reactive sputtering thickness of film surface roughness secondary electron emission coefficient resistance to electron beam bombardment

MgO SECONDARY ELECTRON EMISSION FILM PREPARED BY RADIO-FREQUENCY REACTIVE SPUTERRING 期刊论文 OAI收割
ACTA METALLURGICA SINICA, 2016, 卷号: 52, 期号: 1, 页码: 10-16
作者: Wang Bin; Xong Liangyin; Liu Shi

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收藏 | 浏览/下载：17/0 | 提交时间：2021/02/02

radio-frequency reactive sputtering thickness of film surface roughness secondary electron emission coefficient resistance to electron beam bombardment

Effect of design parameters on the reduction of top piston ring friction (EI CONFERENCE) 会议论文 OAI收割
2nd International Conference on Computer-Aided Design, Manufacturing, Modeling and Simulation, CDMMS 2012, September 21, 2012 - September 23, 2012, Chongqing, China
作者: Wang P.

收藏 | 浏览/下载：138/0 | 提交时间：2013/03/25

In order to reduce ring-liner interface friction power loss this paper focuses on the structure parameters of the top ring and investigates how the value of those parameters will influence top ring-liner friction power loss and the minimum thickness of oil film at top ring-liner interface. A mixed lubrication model is developed to simulate the effect of varying design parameters on ring-liner friction. Case study shows that ring-liner friction power loss will be reduced with decreased axial ring height and barrel height. This study provides a theoretical basis for design the top ring with reduced friction power loss at ring-liner interface. (2013) Trans Tech Publications Switzerland.

Effect of thickness on the structural, electrical and optical properties of ZnO films deposited by MBE (EI CONFERENCE) 会议论文 OAI收割
2011 International Conference on Advanced Design and Manufacturing Engineering, ADME 2011, September 16, 2011 - September 18, 2011, Guangzhou, China
Yang X.; Su S.; Yi X.; Mei T.

收藏 | 浏览/下载：25/0 | 提交时间：2013/03/25

A set of ZnO films of different thickness have been deposited on sapphire substrates using molecular beam epitaxy (MBE) by varying the growth time and the effect of film thickness on the structural electrical and optical properties have been investigated. The X-ray diffraction (XRD) results indicate that the full width at half maximum (FWHM) of the (002) diffraction peak is decreased as the film thickness increasing and the stress along c-axis is stable. Scanning electron microscope (SEM) measurement shows that the grains become more uniform as the film grows thicker and the film surface present distinct hexagon shape as the film is grown up to a thickness of 500nm. The optical absorbance Hall mobility and photoluminescence (PL) intensity are increased in accordance with the thickness of the film. (2011) Trans Tech Publications Switzerland.

The automatic photoresist coating machine on the spherical surface (EI CONFERENCE) 会议论文 OAI收割
2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, August 9, 2009 - August 12, 2009, Changchun, China
作者: Li Y.; Li Y.; Li Y.; Li Y.; Wang H.

收藏 | 浏览/下载：21/0 | 提交时间：2013/03/25

The photoresist coating is an important micro machining process widely applied in engineering. The formed film should be uniform and enough thin to assure the quality of final pattern whose line width is micrometer or nanometer. It is more difficult to process it on the spherical surface than on the flat. In this work mathematic model of film thickness on the spherical surface is proposed by using hydromechanics. The key factors that influence the film thickness are obtained from the analysis of coating process. Then the rational parameters which be controlled by the automatic photoresist coating machine can be final set up according to the result of the coating experiments. And the accuracy analysis of the key part which is used for the main process is performed by the error analytics. This machine not only makes the whole coating process automation but also monitors the film quality in real time. It is adequate for aspheric surface also. 2009 IEEE.

Optical characteristic of ion beam sputter deposited aluminum thin films (EI CONFERENCE) 会议论文 OAI收割
International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Optoelectronic System Design, Manufacturing, and Testings, September 9, 2007 - September 12, 2007, Beijing, China
作者: Yang H.; Liu L.; Liu L.

收藏 | 浏览/下载：28/0 | 提交时间：2013/03/25

Aluminum is a typical active metal very easy to oxidize. An oxide surface layer of about 2-6nm quickly formed in air which adds difficulty to the optical constants determination. An ex-situ method is used to determine the optical constants of aluminum thin films. First Second Third alumina (Al2O3) thin film is deposited by ion beam sputter deposition. The optical constants and thickness are determined by spectral ellipsoemtry (SE). The thickness is verified by grazing x-ray reflection (GXRR) fitting method Al thin film with an Al2O3 cap layer on top is deposited. This cap layer is of the same deposition condition with the first step. By fitting the GXRR spectra based on the acquired structure information the structure information (the thickness of the aluminum and the cap layer the ellipsometric spectra are fitted. The optical constants of the aluminum layer are extracted with the aid of the Drude model. Finally surface roughness and the diffusion between Al-Al2O 3) is obtained an induced transmission filter (ITF) is designed and deposited.

Automatic spin coater for concave spherical substrate (EI CONFERENCE) 会议论文 OAI收割
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China
Fengchao L.; Jingsong G.; Xiaoguo F.; Jingli Z.; Zhijun X.; Jun H.; Fenglin X.; Huiqing W.; Xiaohan L.

收藏 | 浏览/下载：23/0 | 提交时间：2013/03/25

Coating photoresist film with uniform thickness on concave spherical substrate (CSS) is very important for microfabrication of concave spherical optical elements by lithography technique via a laser direct writer for the uneven photoresist film will result in ununiformity of line width so as to influence the characters of optical elements. For improving the uniformity of photoresist film coating on CSS an automatic spin coater was designed. The process and the mathematical model of spin coating for CSS were analyzed. Difficulties for realizing the spin coater consist of the control of multi-axis motion precisely and collaboratively valves on/ff properly and real-timely. A flexible and well-behaved spinning motion system was achieved by tmeans of principal and subordinate CPUs control. The motion program for spin coating could be created and implemented automatically while the pressure and the valves were was watched and controlled in real time. Film coating and laser direct writing experiments on a CSS with aperture equals to 100 mm and radius equals to 370 mm were performed. Photoresist film with uniform thickness on CSS was obtained by selecting proper spin coating parameters such as rotational speed acceleration and viscosity of the photoresist. After development the section analysis by the atomic force microscope showed that photoresist film thickness was about 517 nm in the center and about 520 nm in the edge of substrate the film thickness error was within 1% and the line width was about 6.0 m with steep sides parallel each other. Experimental results indicate that uniform thickness of thin photoresist film has been coated on CSS by the spin coater which contributes to quality improvement of laser direct writing lines on CSS.

椭偏仪的研究进展 期刊论文 OAI收割
激光与光电子学进展, 2007, 卷号: 44, 期号: 3, 页码: 43, 49
杨坤; 王向朝; 步扬

收藏 | 浏览/下载：931/164 | 提交时间：2009/09/18

椭偏仪 ellipsometer 膜厚 thickness of thin film 折射率 refractive index