中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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  • 光电技术研究所 [10]
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Moire-Based Absolute Interferometry With Large Measurement Range in Wafer-Mask Alignment 期刊论文  OAI收割
IEEE PHOTONICS TECHNOLOGY LETTERS, 2015, 卷号: 27, 期号: 4
作者:  
Di, Chengliang;  Yan, Wei;  Hu, Song;  Yin, Didi;  Ma, Chifei
收藏  |  浏览/下载:17/0  |  提交时间:2015/07/10
Moiré-based absolute interferometry with large measurement range in wafer-mask alignment 期刊论文  OAI收割
IEEE Photonics Technology Letters, 2015, 卷号: 27, 期号: 4, 页码: 435-438
作者:  
Di, Chengliang;  Yan, Wei;  Hu, Song;  Yin, Didi;  Ma, Chifei
收藏  |  浏览/下载:23/0  |  提交时间:2016/11/23
Moiré-based absolute interferometry with large measurement range in wafer-mask alignment 期刊论文  OAI收割
IEEE Photonics Technology Letters, 2015, 卷号: 27, 期号: 4, 页码: 435-438
作者:  
Di, Chengliang;  Yan, Wei;  Hu, Song;  Yin, Didi;  Ma, Chifei
收藏  |  浏览/下载:17/0  |  提交时间:2016/11/22
A Moire-Based Four-Channel Focusing and Leveling Scheme for Projection Lithography 期刊论文  OAI收割
IEEE PHOTONICS JOURNAL, 2014, 卷号: 6, 期号: 4
作者:  
Di, Chengliang;  Yan, Wei;  Hu, Song;  Li, Yanli;  Yin, Didi
收藏  |  浏览/下载:24/0  |  提交时间:2015/07/10
Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography 期刊论文  OAI收割
IEEE PHOTONICS JOURNAL, 2014, 卷号: 6, 期号: 3
作者:  
Di, Chengliang;  Hu, Song;  Yan, Wei;  Li, Yanli;  Li, Guang
收藏  |  浏览/下载:19/0  |  提交时间:2015/07/10
A modified alignment method based on four-quadrant-grating moire for proximity lithography 期刊论文  OAI收割
OPTIK, 2014, 卷号: 125, 期号: 17, 页码: 4868-4872
作者:  
Di, Chengliang;  Zhu, Jiangping;  Yan, Wei;  Hu, Song
收藏  |  浏览/下载:16/0  |  提交时间:2015/07/10
A moiré-based four-channel focusing and leveling scheme for projection lithography 期刊论文  OAI收割
IEEE Photonics Journal, 2014, 卷号: 6, 期号: 4, 页码: 6842663
作者:  
Di, Chengliang;  Yan, Wei;  Hu, Song;  Li, Yanli;  Yin, Didi
收藏  |  浏览/下载:14/0  |  提交时间:2016/11/23
Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography 期刊论文  OAI收割
IEEE PHOTONICS JOURNAL, 2014, 卷号: 6, 期号: 3
作者:  
Di, Chengliang;  Hu, Song;  Yan, Wei;  Li, Yanli;  Li, Guang
收藏  |  浏览/下载:13/0  |  提交时间:2016/11/23
A modified alignment method based on four-quadrant-grating moiré for proximity lithography 期刊论文  OAI收割
Optik, 2014, 卷号: 125, 期号: 17, 页码: 4868-4872
作者:  
Di, Chengliang;  Zhu, Jiangping;  Yan, Wei;  Hu, Song
收藏  |  浏览/下载:14/0  |  提交时间:2016/11/23
Technology of focus detection for 193nm projection lithographic tool 会议论文  OAI收割
Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 2012
作者:  
Di, Chengliang;  Yan, Wei;  Hu, Song;  Xu, Feng;  Li, Jinglong
收藏  |  浏览/下载:7/0  |  提交时间:2016/11/24