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浏览/检索结果: 共319条，第1-10条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择提交时间升序提交时间降序发表日期升序发表日期降序题名升序题名降序作者升序作者降序 STCF conceptual design report (Volume 1): Physics & detector 期刊论文  OAI收割 FRONTIERS OF PHYSICS, 2024, 卷号: 19, 期号: 1, 页码: 14701 作者:  Achasov, M;  Ai, XC;  An, LP;  Aliberti, R;  An, Q   |  收藏  |   Lead Oxalate-Induced Nucleation Retardation for High-Performance Indoor and Outdoor Perovskite Photovoltaics 期刊论文  OAI收割 ACS APPLIED MATERIALS & INTERFACES, 2020, 卷号: 12, 期号: 1, 页码: 836-843 作者:  Dong, C;  Li, M;  Zhang, Y;  Wang, KL;  Yuan, S   |  收藏  |   A Novel High Volume Manufacturing Method for Defect-free and High-yield SiN Micro-sieve Membranes 期刊论文  OAI收割 Journal of Microelectronic Manufacturing, 2018 作者:  Zhao C(赵超);  Wei YY(韦亚一);  Chen R(陈睿);  Dong LS(董立松);  Liu YS(刘艳松)   |  收藏  |   Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes 期刊论文  OAI收割 APPLIED OPTICS, 2018 作者:  He JF(何建芳);  Dong LS(董立松);  Ye TC(叶甜春);  Zhao LJ(赵利俊);  Wei YY(韦亚一)   |  收藏  |   Pattern quality and defect evaluation based on cross correlation and power spectral density methods 期刊论文  OAI收割 J Vac Sci Technol B, 2018 作者:  Zhang LB(张利斌);  Ma L(马乐);  Chen R(陈睿);  He JF(何建芳);  Su XJ(苏晓菁)   |  收藏  |   Characteristic study of image-based alignment for increasing accuracy in lithography application 期刊论文  OAI收割 Journal of Vacuum Science & Technology B, 2017 作者:  Zhang LB(张利斌);  Dong LS(董立松);  Su XJ(苏晓菁);  Wei YY(韦亚一)   |  收藏  |   Applications of RCWA on EUV mask optics 会议论文  OAI收割 作者:  Fan TA(范泰安);  Dong LS(董立松);  Wei YY(韦亚一)   |  收藏  |   Necessity of resist model in source mask optimization for negative tone development process 期刊论文  OAI收割 J. Micro/Nanolith. MEMS MOEMS, 2017 作者:  Wei YY(韦亚一);  Dong LS(董立松);  Zhao LJ(赵利俊);  Chen WH(陈文辉);  Ye TC(叶甜春)   |  收藏  |   Optimization of the focus monitor mark in immersion lithography according to illumination type 期刊论文  OAI收割 J. Micro/Nanolith. MEMS MOEMS, 2017 作者:  Zhang LB(张利斌);  Wei YY(韦亚一);  He JF(何建芳);  Su XJ(苏晓菁);  Dong LS(董立松)   |  收藏  |   Mitigating the influence of wafer topography on the implantation process in optical lithography 期刊论文  OAI收割 Optics Letter, 2017 作者:  Su XJ(苏晓菁);  Dong LS(董立松);  Chen WH(陈文辉);  Fan TA(范泰安);  Wei YY(韦亚一)   |  收藏  |