机构

• 上海光学精密机械研... [10]
• 地理科学与资源研究所 [1]

采集方式

• OAI收割 [11]

内容类型

• 期刊论文 [11]

发表日期

• 2024 [1]
• 2009 [9]
• 2007 [1]

学科主题

• 光学 [4]
• 光学::物理光学 [2]
• 光学::物理光学::... [1]
• 激光技术 [1]
• 激光技术::光检测技... [1]

筛选

浏览/检索结果: 共11条，第1-10条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Spatial and Temporal Patterns of Maize Phenology in China From 2001 to 2020 期刊论文  OAI收割 JOURNAL OF GEOPHYSICAL RESEARCH-BIOGEOSCIENCES, 2024, 卷号: 129, 期号: 10, 页码: e2024JG008095 作者:  Peng, Qiongyan;  Shen, Ruoque;  Liu, Yujie;  Li, Xiangqian;  Sun, Qingling   |  收藏  |  浏览/下载：12/0  |  提交时间：2024/11/19 maize  phenology  fused data set  high spatial resolution  climate change  China   Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations 期刊论文  OAI收割 applied optics, 2009, 卷号: 48, 期号: 19, 页码: 3654-3663 Zicheng Qiu; Xiangzhao Wang; Qunyu Bi; Qiongyan Yuan; Bo Peng; and Lifeng Duan 收藏  |  浏览/下载：1046/213  |  提交时间：2010/04/19 Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width 期刊论文  OAI收割 applied optics, 2009, 卷号: 48, 期号: 2, 页码: 261-269 Zicheng Qiu; Xiangzhao Wang; Qiongyan Yuan; and Fan Wang 收藏  |  浏览/下载：1004/198  |  提交时间：2010/04/19 Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width 期刊论文  OAI收割 applied optics, 2009, 卷号: 48, 期号: 19 Zicheng Qiu; Xiangzhao Wang; Qiongyan Yuan; and Fan Wang 收藏  |  浏览/下载：846/127  |  提交时间：2010/04/26 Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node 期刊论文  OAI收割 optik, 2009, 卷号: 120, 期号: 7, 页码: 325, 329 Yuan Qiongyan; 王向朝; Qiu Zicheng 收藏  |  浏览/下载：1362/237  |  提交时间：2009/09/18 Immersion lithography  Polarized illumination  Normalized image log slope  Exposure defocus window   Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations 期刊论文  OAI收割 applied optics, 2009, 卷号: 48, 期号: 19 Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan 收藏  |  浏览/下载：929/161  |  提交时间：2010/04/26 Even aberration measurement of lithographic projection system based on optimized phase-shifting marks 期刊论文  OAI收割 microelectron. eng., 2009, 卷号: 86, 期号: 1, 页码: 78, 82 Yuan Qiongyan; 王向朝; Qiu Zicheng; Wang Fan; 马明英 收藏  |  浏览/下载：1101/181  |  提交时间：2009/09/18 Lithography  Projection optics  Spherical aberration  Astigmatism  Zernike coefficients   Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45nm node 期刊论文  OAI收割 optik, 2009, 卷号: 120, 期号: 7 Qiongyan Yuan; Xiangzhao Wang; Zicheng Qiu 收藏  |  浏览/下载：911/130  |  提交时间：2010/04/26 Even aberration measurement of lithographic projection system based on optimized phase-shifting marks 期刊论文  OAI收割 microelectronic engineering, 2009, 卷号: 86, 期号: 1 Qiongyan Yuan; Xiangzhao Wang; Zicheng Qiu; Fan Wang; Mingying Ma 收藏  |  浏览/下载：914/168  |  提交时间：2010/04/26 Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width 期刊论文  OAI收割 appl. optics, 2009, 卷号: 48, 期号: 2, 页码: 261, 269 Qiu Zicheng; 王向朝; Yuan Qiongyan; Wang Fan 收藏  |  浏览/下载：1153/199  |  提交时间：2009/09/18 LITHOGRAPHY SIMULATION  ABERRATION MEASUREMENT  PROJECTION OPTICS  LENS ABERRATIONS  TOOLS