机构

• 上海光学精密机械研究... [9]
• 地理科学与资源研究所 [1]

采集方式

• OAI收割 [10]

内容类型

• 期刊论文 [10]

发表日期

• 2025 [1]
• 2009 [8]
• 2007 [1]

学科主题

• 光学 [4]
• 光学::物理光学 [2]
• 光学::物理光学::... [1]
• 激光技术 [1]
• 激光技术::光检测技... [1]

筛选

浏览/检索结果: 共10条，第1-10条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择提交时间升序提交时间降序发表日期升序发表日期降序题名升序题名降序作者升序作者降序 AirRadar: Inferring Nationwide Air Quality in China with Deep Neural Networks 期刊论文  OAI收割 THIRTY-NINTH AAAI CONFERENCE ON ARTIFICIAL INTELLIGENCE, AAAI-25, VOL 39 NO 27, 2025, 卷号: N/A, 页码: 28467-28475 作者:  Wang, Qiongyan;  Xia, Yutong;  Zhong, Siru;  Li, Weichuang;  Wu, Yuankai   |  收藏  |   Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations 期刊论文  OAI收割 applied optics, 2009, 卷号: 48, 期号: 19, 页码: 3654-3663 Zicheng Qiu; Xiangzhao Wang; Qunyu Bi; Qiongyan Yuan; Bo Peng; and Lifeng Duan 收藏  |   Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width 期刊论文  OAI收割 applied optics, 2009, 卷号: 48, 期号: 2, 页码: 261-269 Zicheng Qiu; Xiangzhao Wang; Qiongyan Yuan; and Fan Wang 收藏  |   Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width 期刊论文  OAI收割 applied optics, 2009, 卷号: 48, 期号: 19 Zicheng Qiu; Xiangzhao Wang; Qiongyan Yuan; and Fan Wang 收藏  |   Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations 期刊论文  OAI收割 applied optics, 2009, 卷号: 48, 期号: 19 Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan 收藏  |   Even aberration measurement of lithographic projection system based on optimized phase-shifting marks 期刊论文  OAI收割 microelectron. eng., 2009, 卷号: 86, 期号: 1, 页码: 78, 82 Yuan Qiongyan; 王向朝; Qiu Zicheng; Wang Fan; 马明英 收藏  |   Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45nm node 期刊论文  OAI收割 optik, 2009, 卷号: 120, 期号: 7 Qiongyan Yuan; Xiangzhao Wang; Zicheng Qiu 收藏  |   Even aberration measurement of lithographic projection system based on optimized phase-shifting marks 期刊论文  OAI收割 microelectronic engineering, 2009, 卷号: 86, 期号: 1 Qiongyan Yuan; Xiangzhao Wang; Zicheng Qiu; Fan Wang; Mingying Ma 收藏  |   Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width 期刊论文  OAI收割 appl. optics, 2009, 卷号: 48, 期号: 2, 页码: 261, 269 Qiu Zicheng; 王向朝; Yuan Qiongyan; Wang Fan 收藏  |   Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings 期刊论文  OAI收割 opt. express, 2007, 卷号: 15, 期号: 24, 页码: 15878, 15885 Yuan Qiongyan; 王向朝; Qiu Zicheng; Wang Fan; 马明英; He Le 收藏  |