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	Critical-dimension scanning electron microscope characterization of smoothly varying wave structures with a Monte Carlo simulation 期刊论文 OAI收割 JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2021, 卷号: 54 作者: Khan, M. S. S.; Yang, L. H.; Deng, X.; Mao, S. F.; Zou, Y. B. \| 收藏 \| 浏览/下载：82/0 \| 提交时间：2021/09/06 linescan nano characterization CD-SEM Monte Carlo simulation atom lithography
	Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review 期刊论文 OAI收割 MICROMACHINES, 2016, 卷号: 7, 期号: 7 作者: Wang, Changtao; Zhang, Wei; Zhao, Zeyu; Wang, Yanqin; Gao, Ping 收藏 \| 浏览/下载：29/0 \| 提交时间：2016/11/15 surface plasmon polaritons bulk plasmon polaritons diffraction limit subwavelength optics near-field optics metamaterial super resolution nano optical lithography nanostructure fabrication
	Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility 期刊论文 OAI收割 MICROELECTRONIC ENGINEERING, 2016, 卷号: 155, 页码: 55-60 作者: Fan, D; Buitrago, E; Yang, SM; Karim, W; Wu, YQ 收藏 \| 浏览/下载：16/0 \| 提交时间：2017/03/02 EUV Interference lithography High resolution Nano-lithography Achromatic Talbot lithography
	Fabrication of 2-inch nano patterned sapphire substrate with high uniformity by two-beam laser interference lithography 期刊论文 OAI收割 NANOPHOTONICS AND MICRO/NANO OPTICS II, 2014, 卷号: 9277 Dai, LG; Yang, F; Yue, G; Jiang, Y; Jia, HQ; Wang, WX; Chen, H 收藏 \| 浏览/下载：40/0 \| 提交时间：2015/04/14 Laser interference lithography nano-scale patterned sapphire substrate large area high uniformity
	Design and Theoretical Analyses of Tip-Insulator-Metal Structure with Bottom-Up Light Illumination: Formations of Elongated Symmetrical Plasmonic Hot Spot at Sub-10 nm Resolution 期刊论文 OAI收割 PLASMONICS, 2013, 卷号: 8, 期号: 2, 页码: 1073-1078 作者: Zhou, Jie; Wang, Changtao; Zhao, Zeyu; Wang, Yanqin; He, Jiayu 收藏 \| 浏览/下载：30/0 \| 提交时间：2015/04/17 Plasmonics Surface plasmons Nano-lithography Laser material processing
	Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm (EI CONFERENCE) 会议论文 OAI收割 2012 12th IEEE International Conference on Nanotechnology, NANO 2012, August 20, 2012 - August 23, 2012, Birmingham, United kingdom 作者: Li S.; Du J.; Shi L. 收藏 \| 浏览/下载：137/0 \| 提交时间：2013/03/25 A maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed in [optics express Vol. 16 No. 19 (2008) 14397]. Following that to break the limitations in resolution and PSs period of NSSL method in this paper we present PSs immersed super-resolution lithography (NSISL) technology by embedding the PSs into appropriate material to improve the efficiency of the surface plasmon excitation. The energy modulating mechanism and the rules of the resolution affected by silver slab were studied by calculating and analysing the energy distribution. The curve of the lithography resolution versus the silver thickness was presented. In order to verify this method contrast analysis was carried out with NSSL. The results show that the lithography resolution is improved efficiently. Taking a specific configuration with PS diameter of 600nm as an example the resolution was improved to 54nm from 190nm with Ag thickness of 25nm. Based on the calculation results we carried out the experiments. Nano holes with dimension of 75nm and period of 600nm were obtained. 2012 IEEE.
	Design and application of phase photon sieve 期刊论文 OAI收割 OPTIK, 2010, 卷号: 121, 期号: 7, 页码: 637-640 作者: Jiang, Wenbo; Hu, Song; Zhao, Lixin; Yan, Wei; Yang, Yong 收藏 \| 浏览/下载：24/0 \| 提交时间：2015/09/21 Imaging principle Phase photon sieve Design and fabrication Nano-lithography experiment system
	基于碲基相变材料的激光热模光刻技术研究学位论文 OAI收割作者: 魏涛 \| 收藏 \| 浏览/下载：70/0 \| 提交时间：2018/12/26 激光热模光刻 Laser heat-mode lithography 热模光刻胶 heat-mode resists 灰度光刻 greyscale lithography 微纳结构 color printing 彩色打印 micro/nano structures