机构

• 高能物理研究所 [6]
• 长春光学精密机械与物... [1]
• 化学研究所 [1]
• 光电技术研究所 [1]
• 上海应用物理研究所 [1]
• 长春应用化学研究所 [1]
• 更多

采集方式

• OAI收割 [10]
• iSwitch采集 [1]

内容类型

• 期刊论文 [10]
• 会议论文 [1]

发表日期

• 2018 [2]
• 2017 [1]
• 2014 [1]
• 2011 [1]
• 2010 [1]
• 2006 [1]
• 更多

学科主题

• Physics [3]

筛选

浏览/检索结果: 共11条，第1-10条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Fabrication of absorption gratings with x-ray lithography for x-ray phase contrast imaging 期刊论文  iSwitch采集 International journal of modern physics b, 2018, 卷号: 32, 期号: 13, 页码: 8 作者:  Wang, Bo;  Wang, Yu-Ting;  Yi, Fu-Ting;  Zhang, Tian-Chong;  liu, Jing 收藏  |  浏览/下载：51/0  |  提交时间：2019/04/23 X-ray phase contrast imaging  X-ray lithography  High-aspect-ratio   Fabrication of absorption gratings with X-ray lithography for X-ray phase contrast imaging 期刊论文  OAI收割 INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2018, 卷号: 32, 期号: 13, 页码: 1850163 作者:  Wang, B;  Wang B(王波);  Wang YT(王雨婷);  Yi FT(伊福廷);  Zhang TC(张天冲)   |  收藏  |  浏览/下载：31/0  |  提交时间：2019/09/24 X-ray phase contrast imaging  X-ray lithography  high-aspect-ratio   Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography 期刊论文  OAI收割 MICROELECTRONIC ENGINEERING, 2017, 卷号: 170, 页码: 49-53 作者:  Zhao, J;  Wu, YQ;  Xue, CF;  Yang, SM;  Wang, LS   |  收藏  |  浏览/下载：30/0  |  提交时间：2017/12/08 Periodic Structures  Scintillator  Soft X-ray Interference Lithography  High Aspect Ratio   Preparation of long-range ordered nanostructures in semicrystalline diblock copolymer thin films using micromolding 期刊论文  OAI收割 高分子科学(英文版) chinese journal of polymer science, 2014, 卷号: 32, 期号: 9, 页码: 1188-1198 Zhang, Peng; Huang, Hai-ying; Chen, Yu; Yu,Shun; Krywka,Christina; Vayalil,Sarathlal K.; Roth,Stephan V.; He,Tian-bai 收藏  |  浏览/下载：32/0  |  提交时间：2015/10/21 X-RAY-SCATTERING  POLY-EPSILON-CAPROLACTONE  BLOCK-COPOLYMERS  CRYSTAL ORIENTATION  CRYSTALLIZATION BEHAVIOR  POLY(EPSILON-CAPROLACTONE)  LITHOGRAPHY  MORPHOLOGY  CHAINS   Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography 期刊论文  OAI收割 MICROELECTRONIC ENGINEERING, 2011, 卷号: 88, 期号: 10, 页码: 3178-3181 作者:  Jiang, Wenbo;  Hu, Song;  Xie, Changqing;  Zhu, Xiaoli;  Zhao, Lixin 收藏  |  浏览/下载：28/0  |  提交时间：2015/09/21 Submicron photon sieve  E-beam lithography  X-ray lithography  Key technique  Error analysis   Fabrication of a 256-bits organic memory by soft x-ray lithography 期刊论文  OAI收割 CHINESE PHYSICS B, 2010, 卷号: 19, 期号: 5 作者:  Liu Xing-Hua;  Lu Wen-Sheng;  Ji Zhuo-Yu;  Tu De-Yu;  Zhu Xiao-Li   |  收藏  |  浏览/下载：23/0  |  提交时间：2019/04/09 Molecular Memory  Crossbar Array  Soft X-ray Lithography  Electron Beam Lithography   The study on the epoxy resin compound X-ray refractive lens (EI CONFERENCE) 会议论文  OAI收割 ICO20: MEMS, MOEMS, and NEMS, August 21, 2005 - August 26, 2005, Changchun, China 作者:  Wang W.;  Zhang J.;  Zhang J.;  Zhang J.;  Wang W. 收藏  |  浏览/下载：25/0  |  提交时间：2013/03/25 In this paper  the authors report their resent results of the study on the epoxy resin compound X-ray refractive lens. At the first  the theoretical results of the structure parameters for such a device are given. Then  the fabrication technologies are presented. They are deep soft X-ray lithography  mold-manufacturing and molding. The material of X-ray photoresist is PMMA  the mold is made of silicone rubber  and the material of the lens is epoxy resin. Some measured results by means of optical microscope and SEM are also shown. The structure height of the epoxy resin compound lens is measured to be 500 micrometers.   Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application 期刊论文  OAI收割 HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION, 2005, 卷号: 29, 页码: #REF! 作者:  Xie, CQ;  Niu, JB;  Wang, DQ;  Dong, LJ;  Chen, DP 收藏  |  浏览/下载：24/0  |  提交时间：2016/04/12 proximity X-ray lithography  X-ray mask  TaSi film  inductively coupled plasma  synchrotron radiation   Upgrading design of the 3BILA beamline for x-ray nanometre lithography of microelectronic devices at BSRF 期刊论文  OAI收割 CHINESE PHYSICS, 2004, 卷号: 13, 期号: 5, 页码: 731-736 作者:  Yi FT(伊福廷);  Peng LQ(彭良强);  Zhang JF(张菊芳);  Han Y(韩勇);  Yi, FT 收藏  |  浏览/下载：17/0  |  提交时间：2016/06/28 synchrotron radiation  x-ray  x-ray lithography  synchrotron radiation beamline   X-ray lithography technology for the fabrication of deep-submicron T-shaped gate 期刊论文  OAI收割 HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION, 2003, 卷号: 27, 页码: #REF! 作者:  Xie, CQ;  Chen, DP;  Li, B;  Wang, DQ;  Ye, TC 收藏  |  浏览/下载：21/0  |  提交时间：2016/04/12 X-ray lithography  X-ray mask  deep-submicron T-shaped gate  blur