中国科学院机构知识库网格系统: 检索

Magnetic-field-driven ultra-small 3D hydrogel microstructures: Preparation of gel photoresist and two-photon polymerization microfabrication 期刊论文 OAI收割
SENSORS AND ACTUATORS B-CHEMICAL, 2018, 卷号: 274, 页码: 541-550
作者: Xiong, Zhong; Zheng, Chenglin; Jin, Feng; Wei, Rongmei; Zhao, Yuanyuan

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收藏 | 浏览/下载：37/0 | 提交时间：2018/11/01

Two-photon Polymerization 3d Hydrogel Microstructure Fe(3)o(4)Nanoparticles Photoresist Magnetic-field-driven

Nonvolatile and Programmable Photodoping in MoTe2 for Photoresist-Free Complementary Electronic Devices 期刊论文 OAI收割
Advanced Materials, 2018, 卷号: 30, 期号: 52, 页码: 9
作者: Liu, T.; Xiang, D.; Zheng, Y.; Wang, Y. A.; Wang, X. Y.

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收藏 | 浏览/下载：65/0 | 提交时间：2019/09/17

homogeneous p-n junctions and inverters MoTe2/BN heterostructures nonvolatile and programmable photodoping in MoTe2 devices photoresist-free transition-metal dichalcogenides black phosphorus mos2 wse2 inverters graphene diodes Chemistry Science & Technology - Other Topics Materials Science Physics

The steady flying of a plasmonic flying head over a photoresist-coated surface in a near-field photolithography system 期刊论文 OAI收割
NANOTECHNOLOGY, 2016, 卷号: 27, 期号: 18
作者: Ji, Jiaxin; Hu, Yueqiang; Meng, Yonggang; Zhang, Jun; Xu, Jian

收藏 | 浏览/下载：32/0 | 提交时间：2017/01/23

NFPT plasmonic lens molecular glass photoresist molecular gas lubrication

Study on a method of dispensing calibration for photoresist pump based on support vector machine 会议论文 OAI收割
2015 IEEE International Conference on Cyber Technology in Automation, Control, and Intelligent Systems (CYBER), Shenyang, China, June 8-12, 2015
作者: Zhang JL(张吉龙); Hu JT(胡静涛); Cao YX(曹云侠); Chi HD(迟浩东)

收藏 | 浏览/下载：17/0 | 提交时间：2015/12/24

coater and developer photoresist pump support vector machine calibrate

Controllable Self Assembly of Colloidal Crystal Arrays on SU-8 Photoresist Micropatterns 期刊论文 OAI收割
INTEGRATED FERROELECTRICS, 2013, 卷号: 144, 期号: 1, 页码: 79-83
作者: Yang, Shu-Jing; Yu, Bing; Cong, Hai-Lin; Zhang, Mei-Rong; Chi, Xiao-Fang

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收藏 | 浏览/下载：20/0 | 提交时间：2019/04/09

Colloidal Crystal Self Assembly Micropattern Su-8 Photoresist

Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features 期刊论文 OAI收割
macromolecules, 2013, 卷号: 46, 期号: 4, 页码: 1415-1424
Liu CC; Ramirez-Hernandez A; Han E; Craig GSW; Tada Y; Yoshida H; Kang HM; Ji SX; Gopalan P; de Pablo JJ; Nealey PF

收藏 | 浏览/下载：21/0 | 提交时间：2014/04/16

THIN-FILMS NANOPATTERNED SURFACES DIBLOCK COPOLYMERS LITHOGRAPHY DOMAINS PHOTORESIST SIMULATIONS FABRICATION DIMENSIONS BRUSHES

Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文 OAI收割
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China
Tan X.

收藏 | 浏览/下载：25/0 | 提交时间：2013/03/25

In ultraviolet spectroscopy groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order it is important to control the groove shape precisely so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method the required blaze angle is small we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides since the etched groove shape depends on the aspect ratio of the photoresist mask ridge if we wish to fabricate larger gratings with this method we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).

Fabrication of biomimic GaAs subwavelength grating structures for broadband and angular-independent antireflection 期刊论文 OAI收割
microelectronic engineering, 2011, 卷号: 88, 期号: 9, 页码: 2889-2893
Chen X; Fan ZC; Xu Y; Song GF; Chen LH

收藏 | 浏览/下载：46/0 | 提交时间：2012/02/06

INTERFERENCE LITHOGRAPHY PHOTORESIST GRATINGS PROFILE LIGHT NANOSTRUCTURES REFLECTION REDUCTION ARRAY SI

Fabrication and testing of hard X-ray hourglass lenses (EI CONFERENCE) 会议论文 OAI收割
Micro and Nano Technology - 1st International Conference Society of Micro/Nano Technology, CSMNT, November 19, 2008 - November 22, 2008, Beijing, China
作者: Zhu Y.; Wang W.; Wang W.

收藏 | 浏览/下载：26/0 | 提交时间：2013/03/25

Based on the refraction theory of the lens the SU-8 photoresist hard X-ray hourglass lenses with three different structure parameters are fabricated. The mask-back exposure technique is introduced to fabricate the lenses. The focusing performance of this device is tested at Beijing Synchrotron Radiation Facility (BSRF). At the distance of 1.65m from the lenses an obviously focusing performance in one dimension is observed. The relative intensity of the lenses with the largest gain is about 217.7 the gain of the lens is about 1.15 and the dimension of the focus is about 33m. The focusing performance of this device can be improved through the developing of the mask-back exposure technique. 2009 Trans Tech Publications Switzerland.

The automatic photoresist coating machine on the spherical surface (EI CONFERENCE) 会议论文 OAI收割
2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, August 9, 2009 - August 12, 2009, Changchun, China
作者: Li Y.; Li Y.; Li Y.; Li Y.; Wang H.

收藏 | 浏览/下载：21/0 | 提交时间：2013/03/25

The photoresist coating is an important micro machining process widely applied in engineering. The formed film should be uniform and enough thin to assure the quality of final pattern whose line width is micrometer or nanometer. It is more difficult to process it on the spherical surface than on the flat. In this work mathematic model of film thickness on the spherical surface is proposed by using hydromechanics. The key factors that influence the film thickness are obtained from the analysis of coating process. Then the rational parameters which be controlled by the automatic photoresist coating machine can be final set up according to the result of the coating experiments. And the accuracy analysis of the key part which is used for the main process is performed by the error analytics. This machine not only makes the whole coating process automation but also monitors the film quality in real time. It is adequate for aspheric surface also. 2009 IEEE.