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Chinese Academy of Sciences Institutional Repositories Grid
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浏览/检索结果: 共4条,第1-4条 帮助

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A RF plasma source with focused magnetic field for material treatment 期刊论文  OAI收割
PLASMA CHEMISTRY AND PLASMA PROCESSING, 2022
作者:  
Zhang, L. P.;  Chang, L.;  Yuan, X. G.;  Zhang, J. H.;  Zhou, H. S.
  |  收藏  |  浏览/下载:29/0  |  提交时间:2022/12/23
Application of positive pulse to extract ions from HiPIMS ionization region 期刊论文  OAI收割
VACUUM, 2022, 卷号: 204, 页码: 11
作者:  
Li, Liuhe;  Gu, Jiabin;  Xu Y(许亿);  Han, Mingyue;  Bilek, MarcelaMilenaMarie
  |  收藏  |  浏览/下载:21/0  |  提交时间:2022/12/20
The application of a helicon plasma source in reactive sputter deposition of tungsten nitride thin films 期刊论文  OAI收割
Plasma Science and Technology, 2022, 卷号: 24
作者:  
YANG,Yan;  JI,Peiyu;  LI,Maoyang;  YU,Yaowei;  HUANG,Jianjun
  |  收藏  |  浏览/下载:18/0  |  提交时间:2022/12/22
Applying the plasma physical sputtering process to SRF cavity treatment: Simulation and Experiment Study 期刊论文  OAI收割
APPLIED SURFACE SCIENCE, 2022, 卷号: 574, 页码: 10
作者:  
Zhu, Tongtong;  Luo, Didi;  Wu, Andong;  Tan, Teng;  Guo, Hao
  |  收藏  |  浏览/下载:84/0  |  提交时间:2022/01/12