中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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浏览/检索结果: 共9条,第1-9条 帮助

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Interface Si donor control to improve dynamic performance of AlGaN/GaN MIS-HEMTs 期刊论文  OAI收割
AIP ADVANCES, 2017
作者:  
Song, L;  Fu, K(付凯);  Zhang, ZL(张志利);  Sun, SC;  Li, WY
  |  收藏  |  浏览/下载:26/0  |  提交时间:2018/02/05
High-resistivity unintentionally carbon-doped GaN layers with nitrogen as nucleation layer carrier gas grown by metal-organic chemical vapor deposition 期刊论文  OAI收割
AIP ADVANCES, 2017
作者:  
Chen, F;  Sun, SC;  Deng, XG(邓旭光);  Fu, K(付凯);  Yu, GH(于国浩)
  |  收藏  |  浏览/下载:21/0  |  提交时间:2018/02/05
Off-state electrical breakdown of AlGaN/GaN/Ga(Al)N HEMT heterostructure grown on Si(111) 期刊论文  OAI收割
AIP ADVANCES, 2016, 卷号: 6, 期号: 3
作者:  
Li, SM(李水明);  Zhou, Y(周宇);  Gao, HW(高宏伟);  Dai, SJ(戴淑君);  Yu, GH(于国浩)
收藏  |  浏览/下载:25/0  |  提交时间:2017/03/11
AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors with reduced leakage current and enhanced breakdown voltage using aluminum ion implantation 期刊论文  OAI收割
APPLIED PHYSICS LETTERS, 2016, 卷号: 108, 期号: 1
作者:  
Sun, SC;  Fu, K(付凯);  Yu, GH(于国浩);  Zhang, ZL;  Song, L
收藏  |  浏览/下载:48/0  |  提交时间:2017/03/11
Fabrication of normally-off AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors by photo-electrochemical gate recess etching in ionic liquid 期刊论文  OAI收割
APPLIED PHYSICS EXPRESS, 2016, 卷号: 9, 期号: 8
作者:  
Zhang, ZL(张志利);  Qin, SJ(秦双娇);  Fu, K(付凯);  Yu, GH(于国浩);  Li, WY
收藏  |  浏览/下载:141/0  |  提交时间:2017/03/11
Normally-off p-GaN/AlGaN/GaN high electron mobility transistors using hydrogen plasma treatment 期刊论文  OAI收割
APPLIED PHYSICS LETTERS, 2016, 卷号: 109, 期号: 15
作者:  
Hao, RH;  Fu, K(付凯);  Yu, GH(于国浩);  Li, WY;  Yuan, J
收藏  |  浏览/下载:46/0  |  提交时间:2017/03/11
Studies on High-Voltage GaN-on-Si MIS-HEMTs Using LPCVD Si3N4 as Gate Dielectric and Passivation Layer 期刊论文  OAI收割
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 卷号: 63, 期号: 2
作者:  
Zhang, ZL(张志利);  Yu, GH(于国浩);  Zhang, XD(张晓东);  Deng, XG(邓旭光);  Li, SM(李水明)
收藏  |  浏览/下载:43/0  |  提交时间:2017/03/11
16.8 A/600 V AlGaN/GaN MIS-HEMTs employing LPCVD-Si3N4 as gate insulator 期刊论文  OAI收割
ELECTRONICS LETTERS, 2015, 卷号: 51, 期号: 15, 页码: 2
作者:  
Zhang, ZL(张志利);  Yu, GH(于国浩);  Zhang, XD(于国浩);  Tan, SX;  Wu, DD(吴冬东)
收藏  |  浏览/下载:50/0  |  提交时间:2015/12/31
Normally Off AlGaN/GaN MIS-High-Electron Mobility Transistors Fabricated by Using Low Pressure Chemical Vapor Deposition Si3N4 Gate Dielectric and Standard Fluorine Ion Implantation 期刊论文  OAI收割
IEEE ELECTRON DEVICE LETTERS, 2015, 卷号: 36, 期号: 11, 页码: 4
作者:  
Zhang, ZL(张志利);  Fu, K(付凯);  Deng, XG(邓旭光);  Zhang, XD(张晓东);  Fan, YM(范亚明)
收藏  |  浏览/下载:72/0  |  提交时间:2015/12/31