机构

• 上海微系统与信息技... [22]
• 沈阳应用生态研究所 [2]
• 金属研究所 [1]

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• OAI收割 [25]

内容类型

• 期刊论文 [25]

发表日期

• 2012 [6]
• 2011 [6]
• 2006 [2]
• 2005 [1]
• 2004 [5]
• 2002 [2]
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学科主题

• Chemistry;... [3]
• Chemistry [2]
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筛选

浏览/检索结果: 共25条，第1-10条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序作者升序作者降序 Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition 期刊论文  OAI收割 VACUUM, 2012, 卷号: 86, 期号: 8, 页码: 1078-1082 Jin, CG; Yu, T; Bo, Y; Zhao, Y; Zhang, HY; Dong, YJ; Wu, XM; Zhuge, LJ; Ge, SB 收藏  |  浏览/下载：34/0  |  提交时间：2013/04/17 High-k dielectrics  HfO2  ZrO2  Structure  Optical properties   The chemistry and thermal stability of HfTaO/Si interface by x-ray photoelectron spectroscopy 期刊论文  OAI收割 SURFACE AND INTERFACE ANALYSIS, 2012, 卷号: 44, 期号: 4, 页码: 395-398 Yu, T; Jin, CG; Yang, XM; Wu, XM; Zhuge, LJ; Ge, SB 收藏  |  浏览/下载：27/0  |  提交时间：2013/04/17 high-k dielectric  thin film  HfTaO  x-ray photoelectron spectroscopy  interfacial chemistry  thermal property   The structure and electrical properties of HfTaON high-k films prepared by DIBSD 期刊论文  OAI收割 APPLIED SURFACE SCIENCE, 2012, 卷号: 258, 期号: 7, 页码: 2953-2958 Yu, T; Jin, CG; Yang, XM; Dong, YJ; Zhang, HY; Zhuge, LJ; Wu, XM; Wu, ZF 收藏  |  浏览/下载：19/0  |  提交时间：2013/04/17 HfTaON  XPS  TEM  FTIR  Crystallization temperature  Electrical characteristic   Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition 期刊论文  OAI收割 VACUUM, 2012, 卷号: 86, 期号: 8, 页码: 1078-1082 Jin, CG; Yu, T; Bo, Y; Zhao, Y; Zhang, HY; Dong, YJ; Wu, XM; Zhuge, LJ; Ge, SB 收藏  |  浏览/下载：72/0  |  提交时间：2013/05/10 Materials Science  Physics  Multidisciplinary  Applied   The chemistry and thermal stability of HfTaO/Si interface by x-ray photoelectron spectroscopy 期刊论文  OAI收割 SURFACE AND INTERFACE ANALYSIS, 2012, 卷号: 44, 期号: 4, 页码: 395-398 Yu, T; Jin, CG; Yang, XM; Wu, XM; Zhuge, LJ; Ge, SB 收藏  |  浏览/下载：14/0  |  提交时间：2013/05/10 Chemistry  Physical   The structure and electrical properties of HfTaON high-k films prepared by DIBSD 期刊论文  OAI收割 APPLIED SURFACE SCIENCE, 2012, 卷号: 258, 期号: 7, 页码: 2953-2958 Yu, T; Jin, CG; Yang, XM; Dong, YJ; Zhang, HY; Zhuge, LJ; Wu, XM; Wu, ZF 收藏  |  浏览/下载：23/0  |  提交时间：2013/05/10 Chemistry  Materials Science  Physics  Physics  Physical  Coatings & Films  Applied  Condensed Matter   Study on changes in the structure of HfSiO and HfSiON dielectrics with different annealing temperature by photoelectron spectroscopy 期刊论文  OAI收割 APPLIED SURFACE SCIENCE, 2011, 卷号: 257, 期号: 22, 页码: 9277-9281 Yang, XM; Yu, T; Wu, XM; Zhuge, LJ; Ge, SB; He, JJ 收藏  |  浏览/下载：14/0  |  提交时间：2012/04/10 ELSEVIER SCIENCE BV   Improvement of thermal stability and electrical performance in HfSiO gate dielectrics by nitrogen incorporation 期刊论文  OAI收割 PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2011, 卷号: 44, 期号: 2, 页码: 361-366 Yang, XM; Wu, XM; Zhuge, LJ; Yu, T 收藏  |  浏览/下载：16/0  |  提交时间：2012/04/10 ELSEVIER SCIENCE BV   The influence of assisted ion beam bombardment on structure and electrical characteristics of HfSiO dielectric synthesized by DIBSD 期刊论文  OAI收割 MICROELECTRONICS RELIABILITY, 2011, 卷号: 51, 期号: 12, 页码: 2115-2118 Yang, XM; Zhuge, LJ; Wu, XM; Yu, T; Ge, SB 收藏  |  浏览/下载：17/0  |  提交时间：2012/04/10 PERGAMON-ELSEVIER SCIENCE LTD   The influence of assisted ion beam bombardment on structure and electrical characteristics of HfSiO dielectric synthesized by DIBSD 期刊论文  OAI收割 MICROELECTRONICS RELIABILITY, 2011, 卷号: 51, 期号: 12, 页码: 2115-2118 Yang, XM; Zhuge, LJ; Wu, XM; Yu, T; Ge, SB 收藏  |  浏览/下载：22/0  |  提交时间：2013/05/10 Engineering  Physics  Electrical & Electronic  Nanoscience & Nanotechnology  Applied