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Chinese Academy of Sciences Institutional Repositories Grid
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CAS IR Grid
机构
金属研究所 [8]
物理研究所 [2]
中国科学院大学 [1]
上海硅酸盐研究所 [1]
兰州化学物理研究所 [1]
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期刊论文 [13]
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Cytocompatible tantalum films on Ti6Al4V substrate by filtered cathodic vacuum arc deposition
期刊论文
OAI收割
BIOELECTROCHEMISTRY, 2018, 卷号: 122, 页码: 32, 39
作者:
Hee, Ay Ching
;
Cao, Huiliang
;
Zhao, Yue
;
Jamali, Sina S.
;
Bendavid, Avi
  |  
收藏
  |  
浏览/下载:62/0
  |  
提交时间:2018/12/28
Tantalum films
Filtered cathodic vacuum arc deposition
Cytocompatibility
Electrochemical impedance spectroscopy
Predicting multilayer film's residual stress from its monolayers
期刊论文
OAI收割
MATERIALS & DESIGN, 2016, 卷号: 110, 页码: 858-864
Guo, CQ
;
Pei, ZL
;
Fan, D
;
Liu, RD
;
Gong, J
;
Sun, C
收藏
  |  
浏览/下载:27/0
  |  
提交时间:2016/12/28
Residual stress
Multilayer film
Diamond-like carbon
CrN/DLC multilayer
Cathodic vacuum arc
TiN films deposition inside stainless-steel tubes using magnetic field-enhanced arc ion plating
期刊论文
OAI收割
Vacuum, 2015, 卷号: 112, 页码: 46-54
Y. H.
;
Guo Zhao, C. Q.
;
Yang, W. J.
;
Chen, Y. Q.
;
Yu, B. H.
收藏
  |  
浏览/下载:22/0
  |  
提交时间:2015/05/08
Magnetic field
Arc ion plating
Stainless-steel tube
Inner wall
TiN
films
cathodic vacuum-arc
interior surface
inner wall
carbon-films
thin-films
substrate-temperature
residual-stresses
vapor-deposition
current-density
pvd coatings
Effect of pulsed bias on the properties of ZrN/TiZrN films deposited by a cathodic vacuum arc
期刊论文
OAI收割
CHINESE PHYSICS B, 2013, 卷号: 22, 期号: 3
Zhang, GP
;
Wang, XQ
;
Lu, GH
;
Zhou, L
;
Huang, J
;
Chen, W
;
Yang, SZ
收藏
  |  
浏览/下载:26/0
  |  
提交时间:2014/01/16
physical vapor deposition
TiZrN films
pulsed bias
cathodic vacuum arc
Deposition of Ti-Al-N Films by Using a Cathodic Vacuum Arc with Pulsed Bias
期刊论文
OAI收割
PLASMA SCIENCE & TECHNOLOGY, 2013, 卷号: 15, 期号: 6, 页码: 542
Zhang, GP
;
Wang, XQ
;
Lv, GH
;
Pang, H
;
Zhou, L
;
Chen, W
;
Huang, J
;
Yang, S
收藏
  |  
浏览/下载:73/0
  |  
提交时间:2014/01/16
cathodic vacuum arc
Ti-Al-N film
pulsed bias
Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating
期刊论文
OAI收割
Applied Surface Science, 2011, 卷号: 257, 期号: 13, 页码: 5694-5697
Y. H. Zhao
;
G. Q. Lin
;
J. Q. Xiao
;
W. C. Lang
;
C. A. Dong
;
J. Gong
;
C. Sun
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2012/04/13
Shielded arc ion plating
TiN
Thin films
Deposition rate
Droplet
particles
Adhesion
cathodic arc
reactive vacuum
Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating
期刊论文
OAI收割
Surface & Coatings Technology, 2010, 卷号: 204, 期号: 11, 页码: 1800-1810
X. S. Wan
;
S. S. Zhao
;
Y. Yang
;
J. Gong
;
C. Sun
收藏
  |  
浏览/下载:21/0
  |  
提交时间:2012/04/13
Arc ion plating
Cr-N coating
Nitrogen pressure
Pulse bias voltage
chromium nitride films
thin-films
cathodic vacuum
tin
behavior
stress
macroparticles
evaporation
plasma
charge
Deposition of thick TiAlN coatings on 2024 Al/SiC(p) substrate by Arc ion plating
期刊论文
OAI收割
Surface & Coatings Technology, 2008, 卷号: 202, 期号: 21, 页码: 5170-5174
S. S. Zhao
;
H. Du
;
J. D. Zheng
;
Y. Yang
;
W. Wang
;
J. Gong
;
C. Sun
收藏
  |  
浏览/下载:26/0
  |  
提交时间:2012/04/13
gradient TiAlN coating
(ti
Al/SiC(p) substrate
al)n coatings
arc ion plating
nitrogen
flow rate
cathodic vacuum-arc
hard coatings
cutting tools
films
pressure
performance
contact
bias
The effect of applied negative bias voltage on the structure of ti-doped a-c : h films deposited by fcva
期刊论文
iSwitch采集
Applied surface science, 2007, 卷号: 253, 期号: 7, 页码: 3722-3726
作者:
Wang, Peng
;
Wang, Xia
;
Chen, Youming
;
Zhang, Guangan
;
Liu, Weimin
收藏
  |  
浏览/下载:29/0
  |  
提交时间:2019/05/10
Hydrogenated amorphous carbon (a-c : h) films
Applied bias voltage
Filtered cathodic vacuum arc (fcva)
The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA
期刊论文
OAI收割
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
作者:
Wang P(王鹏)
;
Liu WM(刘维民)
;
Zhang JY(张俊彦)
;
Zhang GA(张广安)
收藏
  |  
浏览/下载:22/0
  |  
提交时间:2013/11/01
Hydrogenated amorphous carbon (a-C:H) films
Applied bias voltage
Filtered cathodic vacuum arc (FCVA)