中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
首页
机构
成果
学者
登录
注册
登陆
×
验证码:
换一张
忘记密码?
记住我
×
校外用户登录
CAS IR Grid
机构
半导体研究所 [8]
金属研究所 [2]
物理研究所 [1]
上海微系统与信息技术... [1]
采集方式
OAI收割 [8]
iSwitch采集 [4]
内容类型
期刊论文 [11]
会议论文 [1]
发表日期
2009 [2]
2008 [1]
2005 [3]
2003 [1]
2001 [4]
1995 [1]
更多
学科主题
半导体材料 [2]
半导体物理 [2]
Engineerin... [1]
筛选
浏览/检索结果:
共12条,第1-10条
帮助
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
题名升序
题名降序
提交时间升序
提交时间降序
作者升序
作者降序
发表日期升序
发表日期降序
Room temperature photoluminescence of tensile-strained ge/si0.13ge0.87 quantum wells grown on silicon-based germanium virtual substrate
期刊论文
iSwitch采集
Applied physics letters, 2009, 卷号: 94, 期号: 14, 页码: 3
作者:
Chen, Yanghua
;
Li, Cheng
;
Zhou, Zhiwen
;
Lai, Hongkai
;
Chen, Songyan
收藏
  |  
浏览/下载:64/0
  |  
提交时间:2019/05/12
Chemical vapour deposition
Elemental semiconductors
Energy gap
Germanium
Ge-si alloys
Photoluminescence
Semiconductor epitaxial layers
Semiconductor quantum wells
Silicon
Tensile strength
Room temperature photoluminescence of tensile-strained Ge/Si0.13Ge0.87 quantum wells grown on silicon-based germanium virtual substrate
期刊论文
OAI收割
applied physics letters, 2009, 卷号: 94, 期号: 14, 页码: art. no. 141902
Chen YH
;
Li C
;
Zhou ZW
;
Lai HK
;
Chen SY
;
Ding WC
;
Cheng BW
;
Yu YD
收藏
  |  
浏览/下载:101/14
  |  
提交时间:2010/03/08
chemical vapour deposition
elemental semiconductors
energy gap
germanium
Ge-Si alloys
photoluminescence
semiconductor epitaxial layers
semiconductor quantum wells
silicon
tensile strength
Small sige quantum dots obtained by excimer laser annealing
期刊论文
iSwitch采集
Journal of crystal growth, 2008, 卷号: 310, 期号: 16, 页码: 3746-3751
作者:
Han, Genquan
;
Zeng, Yugang
;
Liu, Yan
;
Yu, Jinzhong
;
Cheng, Buwen
收藏
  |  
浏览/下载:52/0
  |  
提交时间:2019/05/12
Diffusion
Atomic force microscopy
Germanium silicon alloys
In situ doping control for growth of n-p-n si/sige/si heterojunction bipolar transistor by gas source molecular beam epitaxy
期刊论文
iSwitch采集
Journal of crystal growth, 2005, 卷号: 273, 期号: 3-4, 页码: 381-385
作者:
Gao, F
;
Huang, DD
;
Li, JP
;
Liu, C
收藏
  |  
浏览/下载:22/0
  |  
提交时间:2019/05/12
Doping
Molecular beam epitaxy
Germanium silicon alloys
Semiconducting germanium
Semiconducting silicon
Bipolar transistors
In situ doping control for growth of n-p-n Si/SiGe/Si heterojunction bipolar transistor by gas source molecular beam epitaxy
期刊论文
OAI收割
JOURNAL OF CRYSTAL GROWTH, 2005, 卷号: 273, 期号: 3-4, 页码: 381-385
作者:
Gao, F
;
Huang, DD
;
Li, JP
;
Liu, C
  |  
收藏
  |  
浏览/下载:20/0
  |  
提交时间:2021/02/02
doping
molecular beam epitaxy
germanium silicon alloys
semiconducting germanium
semiconducting silicon
bipolar transistors
Interfacial characteristics of fully depleted SiGe-on-insulator (SGOI) substrate fabricated by modified Ge condensation
期刊论文
OAI收割
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2005, 卷号: 20, 期号: 8, 页码: L31-L35
Di, ZF
;
Zhang, M
;
Liu, WL
;
Luo, SH
;
Song, ZT
;
Lin, CL
;
Lin, Q
;
Chu, PK
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2012/03/24
ELECTRON-MOBILITY ENHANCEMENT
STRAINED-SI
DIFFUSION
OXIDATION
GERMANIUM
SILICON
ALLOYS
Effects of hydrostatic pressure on Raman scattering in Ge quantum dot superlattices
期刊论文
OAI收割
THIN SOLID FILMS, 2003, 卷号: 424, 期号: 1, 页码: 23
Qin, L
;
Shen, ZX
;
Teo, KL
;
Peng, CS
;
Zhou, JM
;
Tung, CH
;
Tang, SH
收藏
  |  
浏览/下载:20/0
  |  
提交时间:2013/09/17
SI
GERMANIUM
PHONONS
ISLANDS
SI(001)
SEMICONDUCTORS
SILICON
ALLOYS
Effects of annealing time and si cap layer thickness on the si/sige/si heterostructures thermal stability
期刊论文
iSwitch采集
Journal of crystal growth, 2001, 卷号: 227, 页码: 766-769
作者:
Gao, F
;
Lin, YX
;
Huang, DD
;
Li, JP
;
Sun, DZ
收藏
  |  
浏览/下载:22/0
  |  
提交时间:2019/05/12
Annealing
Molecular beam epitaxy
Germanium silicon alloys
Semiconducting materials
Effects of annealing time and Si cap layer thickness on the Si/SiGe/Si heterostructures thermal stability
期刊论文
OAI收割
JOURNAL OF CRYSTAL GROWTH, 2001, 卷号: 227, 页码: 766-769
作者:
Gao, F
;
Lin, YX
;
Huang, DD
;
Li, JP
;
Sun, DZ
  |  
收藏
  |  
浏览/下载:25/0
  |  
提交时间:2021/02/02
annealing
molecular beam epitaxy
germanium silicon alloys
semiconducting materials
Effects of annealing time and Si cap layer thickness on the Si/SiGe/Si heterostructures thermal stability
期刊论文
OAI收割
journal of crystal growth, 2001, 卷号: 227, 期号: 0, 页码: 766-769
Gao F
;
Lin YX
;
Huang DD
;
Li JP
;
Sun DZ
;
Kong MY
;
Zeng YP
;
Li JM
;
Lin LY
收藏
  |  
浏览/下载:111/14
  |  
提交时间:2010/08/12
annealing
molecular beam epitaxy
germanium silicon alloys
semiconducting materials
STRAIN RELAXATION