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浏览/检索结果: 共27条，第1-10条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Defect-Related Etch Pits on Crystals and Their Utilization 期刊论文  OAI收割 CRYSTALS, 2022, 卷号: 12, 期号: 11, 页码: 20 作者:  Lu, Dongzhu;  Jiang, Quantong;  Ma, Xiumin;  Zhang, Qichao;  Fu, Xiaole   |  收藏  |  浏览/下载：35/0  |  提交时间：2023/01/04 etch pit  crystal  dislocation  orientation  defects   Tuning mechanical and corrosion performance of SiOC glass coatings prepared by thermal MOCVD 期刊论文  OAI收割 JOURNAL OF NON-CRYSTALLINE SOLIDS, 2022, 卷号: 579, 页码: 7 作者:  Liu, Housheng;  Tariq, Naeem ul Haq;  Jing, Weichen;  Cui, Xinyu;  Tang, Mingqiang   |  收藏  |  浏览/下载：26/0  |  提交时间：2022/07/01 SiOC coatings  MOCVD  Hardness and modulus  HF etch resistance   Energy calibration of a CR-39 nuclear-track detector irradiated by charged particles 期刊论文  OAI收割 NUCLEAR SCIENCE AND TECHNIQUES, 2019, 卷号: 30, 期号: 6, 页码: — 作者:  Zhang, Y;  Wang, HW;  Ma, YG;  Liu, LX;  Cao, XG   |  收藏  |  浏览/下载：111/0  |  提交时间：2019/12/30 BULK ETCH RATE   Characterization of a Free-Standing Membrane Supported Superconducting Ti Transition Edge Sensor 期刊论文  OAI收割 IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2017, 卷号: 27, 期号: 4, 页码: 6 作者:  Zhang, Wen;  Miao, Wei;  Wang, Zheng;  Liu, Dong;  Zhong, Jia-Qiang   |  收藏  |  浏览/下载：45/0  |  提交时间：2019/04/08 Superconducting transition edge sensor  thermal conductance  response time  noise equivalent power  KOH wet etch   Two-step etch method to improve the filtering performance of nuclear track membrane 会议论文  OAI收割 作者:  Wang Yang;  Qu Hua;  Mo Dan;  Xiong, L;  Jiao, Q   |  收藏  |  浏览/下载：25/0  |  提交时间：2018/08/20 Nuclear track membrane  Two-step etch method  Double-cone shape  Flux comparison  Filtering performance   Two-step etch method to improve the filtering performance of nuclear track membrane 会议论文  OAI收割 作者:  Wang Yang;  Qu Hua;  Mo Dan;  Xiong, L;  Jiao, Q   |  收藏  |  浏览/下载：33/0  |  提交时间：2018/08/20 Nuclear track membrane  Two-step etch method  Double-cone shape  Flux comparison  Filtering performance   Preparation of silicon nanowires by in situ doping and their electrical properties 期刊论文  OAI收割 COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, 2014, 卷号: 450, 页码: 156-160 作者:  Wang, Jindong;  He, Gen;  Qin, Jinwen;  Li, Lidong;  Guo, Xuefeng   |  收藏  |  浏览/下载：23/0  |  提交时间：2019/04/09 Nanowire  Silicon  Afm  Wet Chemical Etch  Electrical Measurement  Dopant   Observation of etch pits in Fe-36wt%Ni Invar alloy 期刊论文  OAI收割 International Journal of Minerals Metallurgy and Materials, 2014, 卷号: 21, 期号: 7, 页码: 682-686 D. Z. Lu; M. J. Wu 收藏  |  浏览/下载：26/0  |  提交时间：2015/01/14 Invar alloy  dislocations  etch pit technique  alloying elements  dislocation density  gan  reduction   Nano-scale gap filling and mechanism of deposit-etch-deposit process for phase-change material 期刊论文  OAI收割 CHINESE PHYSICS B, 2012, 卷号: 21, 期号: 11, 页码: 115203 Ren, WC; Liu, B; Song, ZT; Xiang, YH; Wang, ZT; Zhang, BC; Feng, SL 收藏  |  浏览/下载：23/0  |  提交时间：2013/04/23 deposit-etch-deposit process  single step deposit  gap filling  re-deposition   Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文  OAI收割 International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China Tan X. 收藏  |  浏览/下载：25/0  |  提交时间：2013/03/25 In ultraviolet spectroscopy  groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore  there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order  it is important to control the groove shape precisely  so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm  especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method  the required blaze angle is small  we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles  and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model  the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides  since the etched groove shape depends on the aspect ratio of the photoresist mask ridge  if we wish to fabricate larger gratings with this method  we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).