机构

• 半导体研究所 [6]
• 力学研究所 [2]

采集方式

• OAI收割 [5]
• iSwitch采集 [3]

内容类型

• 期刊论文 [7]
• 会议论文 [1]

发表日期

• 2011 [1]
• 2009 [6]
• 2008 [1]

学科主题

• 半导体物理 [2]
• 光电子学 [1]

筛选

浏览/检索结果: 共8条，第1-8条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Theoretical and engineering research on the municipal solid waste plasma gasification 会议论文  OAI收割 International Conference on Thermal Treatment Technologies and Hazardous Waste Combustors 2011, Jacksonville, FL, United states, MAY 10-13, 2011 作者:  Sheng HZ(盛宏至);  Deng J(邓晶);  Li YJ(李要建);  Xu YX(徐永香);  Sheng HZ(盛宏至) 收藏  |  浏览/下载：42/0  |  提交时间：2013/02/26 Atmospheric pressure  Calorific value  Combustion  Combustors  Conceptual design  Energy conversion  Gas engines  Gasification  Hazardous materials  Heat treatment  Hydrochloric acid  Organic pollutants  Plasma applications  Plasmas  Radioactive waste disposal  Synthesis gas  Waste disposal  Waste treatment  Cooling process  Dew points  Energy recovery  Engine generator  Environmentally-friendly technology  HCl gas  High temperature  Hot syngas  Kitchen garbage  Lower heating value  MSW  Plasma gasification  Plasma reactors  Pre-processing  Pretreatment systems  Reaction temperature  Reactor  Reactor chamber  Syn-gas   Enhancement of field emission of the zno film by the reduced work function and the increased conductivity via hydrogen plasma treatment 期刊论文  iSwitch采集 Applied physics letters, 2009, 卷号: 94, 期号: 26, 页码: 3 作者:  You, J. B.;  Zhang, X. W.;  Cai, P. F.;  Dong, J. J.;  Gao, Y. 收藏  |  浏览/下载：27/0  |  提交时间：2019/05/12 Atomic force microscopy  Field emission  Hydrogen  Ii-vi semiconductors  Plasma materials processing  Sputter deposition  Wide band gap semiconductors  Work function  Zinc compounds   Inductively coupled plasma etching in fabrication of 2d inp-based photonic crystals 期刊论文  iSwitch采集 Journal of vacuum science & technology b, 2009, 卷号: 27, 期号: 3, 页码: 1093-1096 作者:  Wang, Hailing;  Xing, Mingxin;  Ren, Gang;  Zheng, Wanhua 收藏  |  浏览/下载：34/0  |  提交时间：2019/05/12 Iii-v semiconductors  Indium compounds  Photonic crystals  Plasma materials processing  Semiconductor lasers  Sputter etching   Enhancement of conductivity and transmittance of zno films by post hydrogen plasma treatment 期刊论文  iSwitch采集 Journal of applied physics, 2009, 卷号: 105, 期号: 8, 页码: 6 作者:  Cai, P. F.;  You, J. B.;  Zhang, X. W.;  Dong, J. J.;  Yang, X. L. 收藏  |  浏览/下载：25/0  |  提交时间：2019/05/12 Annealing  Carrier density  Carrier mobility  Diffusion  Electrical conductivity  Electrical resistivity  Hydrogen  Ii-vi semiconductors  Impurity states  Interstitials  Light transmission  Plasma materials processing  Semiconductor thin films  Sputter deposition  Vacancies (crystal)  Visible spectra  Wide band gap semiconductors  Zinc compounds   Enhancement of conductivity and transmittance of ZnO films by post hydrogen plasma treatment 期刊论文  OAI收割 journal of applied physics, 2009, 卷号: 105, 期号: 8, 页码: art. no. 083713 作者:  Zhang XW;  You JB;  Yin ZG 收藏  |  浏览/下载：82/1  |  提交时间：2010/03/08 annealing  carrier density  carrier mobility  diffusion  electrical conductivity  electrical resistivity  hydrogen  II-VI semiconductors  impurity states  interstitials  light transmission  plasma materials processing  semiconductor thin films  sputter deposition  vacancies (crystal)  visible spectra  wide band gap semiconductors  zinc compounds   Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment 期刊论文  OAI收割 applied physics letters, 2009, 卷号: 94, 期号: 26, 页码: art. no. 262105 作者:  Zhang XW;  Yin ZG;  You JB 收藏  |  浏览/下载：107/13  |  提交时间：2010/03/08 atomic force microscopy  field emission  hydrogen  II-VI semiconductors  plasma materials processing  sputter deposition  wide band gap semiconductors  work function  zinc compounds   Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals 期刊论文  OAI收割 journal of vacuum science & technology b, 2009, 卷号: 27, 期号: 3, 页码: 1093-1096 Wang HL; Xing MX; Ren G; Zheng WH 收藏  |  浏览/下载：134/0  |  提交时间：2010/03/08 III-V semiconductors  indium compounds  photonic crystals  plasma materials processing  semiconductor lasers  sputter etching   Effects Of The Length Of A Cylindrical Solid Shield On The Entrainment Of Ambient Air Into Turbulent And Laminar Impinging Argon Plasma Jets 期刊论文  OAI收割 Plasma Chemistry And Plasma Processing, 2008, 页码: 85-105 作者:  Wang HX(王海兴);  Chen X(陈熙);  Pan WX(潘文霞) 收藏  |  浏览/下载：1177/44  |  提交时间：2009/08/03 Impinging Plasma Jet  Air Entrainment  Solid-Shield Effect  Materials Processing  Modeling  High-Velocity  Gas Shroud  Deposition  Diffusion  Substrate  Flow