机构

• 半导体研究所 [27]

采集方式

• OAI收割 [27]

内容类型

• 期刊论文 [20]
• 会议论文 [7]

发表日期

• 2011 [3]
• 2010 [1]
• 2008 [2]
• 2007 [1]
• 2006 [3]
• 2005 [3]
• 更多

学科主题

• 半导体材料 [27]

筛选

浏览/检索结果: 共27条，第1-10条 帮助 限定条件 学科主题：半导体材料     条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Improvement of electroluminescent performance of n-ZnO/AlN/p-GaN light-emitting diodes by optimizing the AlN barrier layer 期刊论文  OAI收割 journal of applied physics, 2011, 卷号: 109, 期号: 9, 页码: article no.93708 作者:  Zhang XW 收藏  |  浏览/下载：47/3  |  提交时间：2011/07/05 UV ELECTROLUMINESCENCE  THIN-FILMS  ZNO   The effect of different oriented sapphire substrates on the growth of polar and non-polar ZnMgO by MOCVD 期刊论文  OAI收割 journal of crystal growth, 2011, 卷号: 314, 期号: 1, 页码: 39-42 作者:  Song HP;  Shi K;  Sang L;  Wei HY 收藏  |  浏览/下载：58/3  |  提交时间：2011/07/05 Metal organic chemical vapor deposition  Sapphire  Zinc compounds  Semiconducting II-VI materials  VAPOR-PHASE EPITAXY  OPTICAL-PROPERTIES  ZNO NANORODS  RAMAN-SCATTERING  M-PLANE  FILMS  PHOTOLUMINESCENCE  DEPOSITION  NANOWIRES  FIELDS   Effect of high temperature AlGaN buffer thickness on GaN Epilayer grown on Si(111) substrates 期刊论文  OAI收割 journal of materials science-materials in electronics, 2011, 卷号: 22, 期号: 8, 页码: 1028-1032 作者:  Pan X 收藏  |  浏览/下载：20/0  |  提交时间：2011/09/14 CHEMICAL-VAPOR-DEPOSITION  PHASE EPITAXY  ALN INTERLAYERS  FILMS  STRESS  LAYERS  DISLOCATIONS  REDUCTION  DENSITY  DIODES   Origin of flat-band voltage sharp roll-off in metal gate/high-k/ultrathin- SiO2/Si p-channel metal-oxide-semiconductor stacks 期刊论文  OAI收割 applied physics letters, 2010, 卷号: 97, 期号: 13, 页码: art. no. 132908 Zheng XH (Zheng X. H.); Huang AP (Huang A. P.); Xiao ZS (Xiao Z. S.); Yang ZC (Yang Z. C.); Wang M (Wang M.); Zhang XW (Zhang X. W.); Wang WW (Wang W. W.); Chu PK (Chu Paul K.) 收藏  |  浏览/下载：10/0  |  提交时间：2010/11/14 OXYGEN  GATE  DIFFUSION  FILMS   Fracture properties of silicon carbide thin films charcterized by bulge test of long membranes 会议论文  OAI收割 3rd ieee international conference of nano/micro engineered and molecular systems, sanya, peoples r china, jan 06-09, 2008 Zhou, W; Yang, JL; Sun, GS; Liu, XF; Yang, FH; Li, JM 收藏  |  浏览/下载：49/0  |  提交时间：2010/03/09 bulge test fracture property  silicon carbide thin films  Weibull distribution function   Fracture Properties of LPCVD Silicon Nitride and Thermally Grown Silicon Oxide Thin Films From the Load-Deflection of Long Si3N4 and SiO2/Si3N4 Diaphragms 期刊论文  OAI收割 journal of microelectromechanical systems, 2008, 卷号: 17, 期号: 5, 页码: 1120-1134 Yang, JL; Gaspar, J; Paul, O 收藏  |  浏览/下载：24/0  |  提交时间：2010/03/08 Bulge test  fracture  pooled Weibull analysis  silicon nitride (Si3N4)  silicon oxide (SiO2)   Field emission mechanism from a single-layer ultra-thin semiconductor film cathode 期刊论文  OAI收割 journal of physics d-applied physics, 2007, 卷号: 40, 期号: 19, 页码: 5828-5832 Duan ZQ (Duan, Zhi-Qiang); Wang RZ (Wang, Ru-Zhi); Yuan RY (Yuan, Rui-Yang); Yang W (Yang, Wei); Wang B (Wang, Bo); Yan H (Yan, Hui) 收藏  |  浏览/下载：36/0  |  提交时间：2010/03/29 AMORPHOUS-CARBON FILMS   Electrical properties of B-doped polycrystalline silicon thin films prepared by rapid thermal chemical vapour deposition 期刊论文  OAI收割 thin solid films, 2006, 卷号: 497, 期号: 1-2, 页码: 157-162 Ai B; Shen H; Liang ZC; Chen Z; Kong GL; Liao XB 收藏  |  浏览/下载：48/0  |  提交时间：2010/04/11 chemical vapour deposition  electrical properties and measurements  scanning electron microscopy  polycrystalline silicon  GRAIN-BOUNDARIES  STATES   Crack control in GaN grown on silicon (111) using In doped low-temperature AlGaN interlayer by metalorganic chemical vapor deposition 期刊论文  OAI收割 optical materials, 2006, 卷号: 28, 期号: 10, 页码: 1227-1231 Wu JJ (Wu Jiejun); Han XX (Han Xiuxun); Li JM (Li Jiemin); Wei HY (Wei Hongyuan); Cong GW (Cong Guangwei); Liu XL (Liu Xianglin); Zhu QS (Zhu Qinsheng); Wang ZG (Wang Zhanguo); Jia QJ (Jia Quanjie); Guo LP (Guo Liping); Hu TD (Hu Tiandou); Wang HH (Wang Huanhua) 收藏  |  浏览/下载：49/0  |  提交时间：2010/04/11 in doping  cracks  Si(111) substrate  LT-AlGaN interlayer  metalorganic chemical vapor deposition  GaN  PHASE EPITAXY  INDIUM-SURFACTANT  OPTICAL-PROPERTIES  SI(111)  STRESS  FILMS   Optical and structural properties of ZnO films grown on Si(100) substrates by MOCVD - art. no. 60290G 会议论文  OAI收割 20th congress of the international-commission-for-optics, changchun, peoples r china, aug 21-26, 2005 Shen, WJ; Duan, Y; Wang, J; Wang, QY; Zeng, YP 收藏  |  浏览/下载：95/18  |  提交时间：2010/03/29 ZnO  MOCVD  thermal annealing  photoluminescence  x-ray diffraction  atomic force microscopy  PULSED-LASER DEPOSITION  THIN-FILMS  PHOTOLUMINESCENCE  MECHANISMS  EPITAXY  CVD  SI