机构

• 近代物理研究所 [4]
• 物理研究所 [3]
• 金属研究所 [1]
• 半导体研究所 [1]

采集方式

• OAI收割 [9]

内容类型

• 期刊论文 [9]

发表日期

• 2010 [2]
• 2006 [2]
• 2002 [1]
• 2001 [1]
• 2000 [1]
• 1999 [1]
• 更多

学科主题

• 半导体物理 [1]

筛选

浏览/检索结果: 共9条，第1-9条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Overview of the Shanghai EBIT 期刊论文  OAI收割 JOURNAL OF INSTRUMENTATION, 2010, 卷号: 5, 页码: 10 作者:  Fu, Y.;  Yao, K.;  Wei, B.;  Lu, D.;  Hutton, R.   |  收藏  |  浏览/下载：20/0  |  提交时间：2018/05/31 Ion sources (positive ions, negative ions, electron cyclotron resonance (ECR), electron beam (EBIS))  Plasma diagnostics - charged-particle spectroscopy  Ionization and excitation processes   Effects of radio-frequency bias on silicon oxide films deposited by dual electron cyclotron resonance-radio frequency hybrid plasma 期刊论文  OAI收割 ACTA PHYSICA SINICA, 2010, 卷号: 59, 页码: 1338-1343 作者:  Ke Bo;  Wang Lei;  Ni Tian-Ling;  Ding Fang;  Chen Mu-Di   |  收藏  |  浏览/下载：21/0  |  提交时间：2018/05/31 electron cyclotron resonance-radio frequency dual hybrid plasma  radio-frequency bias  silicon oxide films   Spectroscopic study on pulsed laser ablation of graphite target in ECR nitrogen plasma for carbon nitride film deposition 期刊论文  OAI收割 DIAMOND AND RELATED MATERIALS, 2006, 卷号: 15, 页码: 1350-1356 作者:  Shen, X. K.;  Sun, J.;  Xu, N.;  Ying, Z. F.;  Shi, L. Q.   |  收藏  |  浏览/下载：28/0  |  提交时间：2018/05/31 plume emission  carbon nitride  pulsed laser ablation  electron cyclotron resonance microwave discharge  nitrogen plasma   Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering 期刊论文  OAI收割 Plasma Science & Technology, 2006, 卷号: 8, 期号: 4, 页码: 425-428 P. Gao; J. Xu; Y. Piao; W. Y. Ding; X. L. Deng; C. Dong 收藏  |  浏览/下载：15/0  |  提交时间：2012/04/13 carbon nitride  tribological property  unbalanced magnetron sputtering  cyclotron-resonance plasma  raman-spectroscopy  thin-films  c-n  nitrogen   ECR plasma in growth of cubic GaN by low pressure MOCVD 期刊论文  OAI收割 plasma chemistry and plasma processing, 2002, 卷号: 22, 期号: 1, 页码: 159-174 Gu B; Xu Y; Qin FW; Wang SS; Sui Y; Wang ZG 收藏  |  浏览/下载：93/7  |  提交时间：2010/08/12 ECR plasma  cubic GaN  low pressure MOCVD  MOLECULAR-BEAM EPITAXY  CYCLOTRON-RESONANCE PLASMA  LIGHT-EMITTING-DIODES  VAPOR-PHASE EPITAXY  GALLIUM NITRIDE  GAAS  DIMETHYLHYDRAZINE   Preparation of CNx/TiNy multilayers by ion beam sputtering 期刊论文  OAI收割 JOURNAL OF CRYSTAL GROWTH, 2001, 卷号: 233, 期号: 1-2, 页码: 303 Yu, DL; Tian, YJ; He, JL; Xiao, FR; Wang, TS; Li, DC; Li, L; Zheng, G; Yanagisawa, O 收藏  |  浏览/下载：28/0  |  提交时间：2013/09/24 CARBON NITRIDE FILMS  CYCLOTRON-RESONANCE PLASMA  THIN-FILMS  PHYSICAL-PROPERTIES  CRYSTALLINE C3N4  DEPOSITION  COATINGS   The dependence of GaN growth rate on electron temperature in an ECR plasma 期刊论文  OAI收割 SURFACE & COATINGS TECHNOLOGY, 2000, 卷号: 131, 期号: 1-3, 页码: 470 Pu, YK; Ren, YF; Yang, SZ; Dywer, D; Zhang, XG; Jia, XJ 收藏  |  浏览/下载：19/0  |  提交时间：2013/09/23 MOLECULAR-BEAM EPITAXY  CYCLOTRON-RESONANCE PLASMA  VAPOR-PHASE EPITAXY  FILMS  DEPOSITION   Silicon nitride films synthesized by reactive pulsed laser deposition in an electron cyclotron resonance nitrogen plasma 期刊论文  OAI收割 THIN SOLID FILMS, 1999, 卷号: 350, 页码: 101-105 作者:  Wu, JD;  Sun, J;  Zhong, XX;  Zhou, ZY;  Wu, CZ   |  收藏  |  浏览/下载：24/0  |  提交时间：2018/05/31 reactive pulsed laser deposition  electron cyclotron resonance plasma  silicon nitride   Direct photoetching of single crystal SiC by VUV 266 nm multiwavelength laser ablation 期刊论文  OAI收割 APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1997, 卷号: 64, 期号: 4, 页码: 367 Zhang, J; Sugioka, K; Wada, S; Tashiro, H; Toyoda, K 收藏  |  浏览/下载：13/0  |  提交时间：2013/09/17 CYCLOTRON-RESONANCE PLASMA  QUARTZ