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Chinese Academy of Sciences Institutional Repositories Grid
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浏览/检索结果: 共14条,第1-10条 帮助

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CMOS:Past,present and future 专著  OAI收割
:Elsevier, 2018
作者:  
Henry Homayoun Radamson;  罗军;  赵超
  |  收藏  |  浏览/下载:20/0  |  提交时间:2019/05/23
Complementary Metal Oxide Semiconductor 专著  OAI收割
:IntechOpen, 2018
作者:  
Yin HX(殷华湘);  Wang GL(王桂磊);  Yao JX(姚佳欣);  Henry Homayoun Radamson
  |  收藏  |  浏览/下载:23/0  |  提交时间:2019/05/23
The Challenges of Advanced CMOS Process from 2D to 3D 期刊论文  OAI收割
Applied Sciences, 2017
作者:  
Wang GL(王桂磊);  Gu SH(顾世海);  Liu JB(刘金彪);  Xiang JJ(项金娟);  Li JJ(李俊杰)
  |  收藏  |  浏览/下载:10/0  |  提交时间:2018/07/05
On the manifestation ofGe Pre-amorphization Implantation (PAI) in forming ultrathin TiSix for Ti direct contact on Si in sub-16/14 nm Complementary Metal-Oxide-Semiconductor (CMOS) technology nodes 期刊论文  OAI收割
ECS Journal of Solid State Science and Technology, 2017
作者:  
Wang GL(王桂磊);  Li JF(李俊峰);  Zhao C(赵超);  Ye TC(叶甜春)
  |  收藏  |  浏览/下载:42/0  |  提交时间:2018/06/08
Study of sigma-shaped source/drain recesses for embedded-SiGe pMOSFETs 期刊论文  OAI收割
Microelectronic Engineering, 2017
作者:  
Zhu HL(朱慧珑);  Xu QX(徐秋霞);  Li JF(李俊峰);  Zhao C(赵超);  Henry Homayoun Radamson
  |  收藏  |  浏览/下载:47/0  |  提交时间:2018/07/09
pMOSFETs Featuring ALD W Filling Metal Using SiH4 and B2H6 Precursors in 22 nm Node CMOS Technology 期刊论文  OAI收割
Nanoscale Research Letters, 2017
作者:  
Zhao C(赵超);  Wang GL(王桂磊);  Luo J(罗军);  Liu JB(刘金彪);  Yang T(杨涛)
  |  收藏  |  浏览/下载:15/0  |  提交时间:2018/07/05
Investigation on direct-gap GeSn alloys for high-performance tunneling field-effect transistor applications 期刊论文  OAI收割
Electron Devices Technology and Manufacturing Conference, 2017
作者:  
Liu L(刘磊);  Wang GL(王桂磊);  Henry Homayoun Radamson
  |  收藏  |  浏览/下载:6/0  |  提交时间:2018/07/05
Integration of Highly Strained SiGe in Source and Drain with HK and MG for 22 nm Bulk PMOS Transistors 期刊论文  OAI收割
Nanoscale Research Letters, 2017
作者:  
Wang GL(王桂磊);  Ye TC(叶甜春);  Henry Homayoun Radamson;  Zhao C(赵超)
  |  收藏  |  浏览/下载:12/0  |  提交时间:2018/07/05
Optimization of Selective Growth of SiGe for Source/Drain in 14nm and Beyond Nodes FinFETs 期刊论文  OAI收割
International Journal of High Speed Electronics and Systems, 2017
作者:  
Henry Homayoun Radamson;  Zhu HL(朱慧珑);  Yin HX(殷华湘);  Qin ZL(秦长亮);  Luo J(罗军)
  |  收藏  |  浏览/下载:13/0  |  提交时间:2018/07/05
Graphene 专著  OAI收割
:Springer, 2017
作者:  
Henry Homayoun Radamson
  |  收藏  |  浏览/下载:14/0  |  提交时间:2018/07/30