中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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  • 微电子研究所 [39]
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Improved Ti germanosilicidation by Ge pre-amorphization implantation (PAI) for advanced contact technologies 期刊论文  OAI收割
Microelectronic Engineering, 2018
作者:  
Mao SJ(毛淑娟);  Wang GL(王桂磊);  Xu J(许静);  Zhang D(张丹);  Luo X(罗雪)
  |  收藏  |  浏览/下载:45/0  |  提交时间:2019/05/05
Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes 期刊论文  OAI收割
APPLIED OPTICS, 2018
作者:  
He JF(何建芳);  Dong LS(董立松);  Ye TC(叶甜春);  Zhao LJ(赵利俊);  Wei YY(韦亚一)
  |  收藏  |  浏览/下载:19/0  |  提交时间:2019/05/05
Impact of Ge Preamorphization Implantation on Both the Formation of Ultrathin TiSix and the Specific Contact Resistivity in TiSix/n-Si Contacts 期刊论文  OAI收割
IEEE Transactions on Electron Devices, 2018
作者:  
Ye TC(叶甜春);  Mao SJ(毛淑娟);  Wang GL(王桂磊);  Xu J(许静);  Luo X(罗雪)
  |  收藏  |  浏览/下载:36/0  |  提交时间:2019/05/05
Band-Edge Work Function Obtained by Plasma Doping TiN Metal Gate for nMOS Device Application 期刊论文  OAI收割
IEEE TRANSACTIONS ON ELECTRON DEVICE, 2018
作者:  
Shan Tang;  Tao GL(陶桂龙);  Li JF(李俊峰);  Zhu HL(朱慧珑);  Wang XL(王晓磊)
  |  收藏  |  浏览/下载:27/0  |  提交时间:2019/05/20
Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process 期刊论文  OAI收割
IEEE Electron Device Letters, 2018
作者:  
Zhang QZ(张青竹);  Yin HX(殷华湘);  Meng LK(孟令款);  Yao JX(姚佳欣);  Li JJ(李俊杰)
  |  收藏  |  浏览/下载:27/0  |  提交时间:2019/05/05
Fabricating metal structures with taper angles and smooth sidewalls 期刊论文  OAI收割
Journal of Micromechanics and Microengineering, 2017
作者:  
Li JF(李俊峰);  Wang WB(王玮冰)
  |  收藏  |  浏览/下载:28/0  |  提交时间:2018/05/14
Charge pumping test technique using CMOS ring oscillator on leakage issue 期刊论文  OAI收割
Microelectronics Journal, 2017
作者:  
Zhao C(赵超);  Liu YB(刘勇波);  Zhu ZY(朱正勇);  Zhu HL(朱慧珑);  Wan GX(万光星)
  |  收藏  |  浏览/下载:20/0  |  提交时间:2018/07/09
On the manifestation ofGe Pre-amorphization Implantation (PAI) in forming ultrathin TiSix for Ti direct contact on Si in sub-16/14 nm Complementary Metal-Oxide-Semiconductor (CMOS) technology nodes 期刊论文  OAI收割
ECS Journal of Solid State Science and Technology, 2017
作者:  
Wang GL(王桂磊);  Li JF(李俊峰);  Zhao C(赵超)
  |  收藏  |  浏览/下载:42/0  |  提交时间:2018/06/08
Study of sigma-shaped source/drain recesses for embedded-SiGe pMOSFETs 期刊论文  OAI收割
Microelectronic Engineering, 2017
作者:  
Zhu HL(朱慧珑);  Xu QX(徐秋霞);  Li JF(李俊峰);  Zhao C(赵超);  Henry Homayoun Radamson
  |  收藏  |  浏览/下载:47/0  |  提交时间:2018/07/09
pMOSFETs Featuring ALD W Filling Metal Using SiH4 and B2H6 Precursors in 22 nm Node CMOS Technology 期刊论文  OAI收割
Nanoscale Research Letters, 2017
作者:  
Zhao C(赵超);  Wang GL(王桂磊);  Luo J(罗军);  Liu JB(刘金彪);  Yang T(杨涛)
  |  收藏  |  浏览/下载:15/0  |  提交时间:2018/07/05